Nanoantenna-Enhanced Resonant Detectors for Improved Infrared Detector Performance
Abstract not provided.
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Jump to search filtersMonolithically fabricated tunable long-wave infrared detectors based on dynamic graphene metasurfaces
Applied Physics Letters
Here, the design, fabrication, and characterization of an actively tunable long-wave infrared detector, made possible through direct integration of a graphene-enabled metasurface with a conventional type-II superlattice infrared detector, are reported. This structure allows for post-fabrication tuning of the detector spectral response through voltage-induced modification of the carrier density within graphene and, therefore, its plasmonic response. These changes modify the transmittance through the metasurface, which is fabricated monolithically atop the detector, allowing for spectral control of light reaching the detector. Importantly, this structure provides a fabrication-controlled alignment of the metasurface filter to the detector pixel and is entirely solid-state. Using single pixel devices, relative changes in the spectral response exceeding 8% have been realized. These proof-of-concept devices present a path toward solid-state hyperspectral imaging with independent pixel-to-pixel spectral control through a voltage-actuated dynamic response.
A COLD ATOM INTERFEROMETRY SENSOR PLATFORM BASED ON DIFFRACTIVE OPTICS AND INTEGRATED PHOTONICS
Abstract not provided.
DEPLOYABLE COLD ATOM INTERFEROMETRY SENSOR PLATFORMS BASED ON DIFFRACTIVE OPTICS AND INTEGRATED PHOTONICS
Abstract not provided.
Formation of Ohmic Contacts to n-GaAs at Temperatures Compatible with Indium Flip-Chip Bonding
Abstract not provided.
High aspect ratio silicon template fabrication for 100 keV X-ray phase contrast imaging
Abstract not provided.
Novel Plating Approaches for Grating Fabrication: Conformal Deposition Through Mask Filling and Superfilled Electrodeposition
Abstract not provided.
Epitaxial PZT Thin Films on Low Dielectric Constant Single Crystal Substrates
Abstract not provided.
Fabrication of extreemly high aspect ratio diffraction gratings for X-ray phase contrast imaging
Abstract not provided.
Formation of Ohmic Contacts to n-GaAs at Temperatures Compatible with Indium Flip-Chip Bonding
Abstract not provided.
High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication
Materials Science in Semiconductor Processing
Lab based x-ray phase contrast imaging (XPCI) systems have historically focused on medical applications, but there is growing interest in material science applications for non-destructive analysis of low density materials. Extending this imaging technique to higher density materials or larger samples requires higher aspect ratio gratings, to allow the use of a higher energy x-ray source. In this work, we demonstrate the use of anisotropic silicon (Si) etching in potassium hydroxide (KOH), to achieve extremely high aspect ratio gratings. This method has been shown to be effective in fabricating deep, uniform gratings by taking advantage of the etch selectivity of differing crystalline planes of silicon. Our work has demonstrated a method for determining Si crystalline plane directions, specific to (110) Si wafers, enabling high alignment accuracy of the etch mask to these crystalline planes.
Double sided grating fabrication for high energy X-ray phase contrast imaging
Materials Science in Semiconductor Processing
State of the art grating fabrication currently limits the maximum source energy that can be used in lab based x-ray phase contrast imaging (XPCI) systems. In order to move to higher source energies, and image high density materials or image through encapsulating barriers, new grating fabrication methods are needed. In this work we have analyzed a new modality for grating fabrication that involves precision alignment of etched gratings on both sides of a substrate, effectively doubling the thickness of the grating. We have achieved a front-to-backside feature alignment accuracy of 0.5 µm demonstrating a methodology that can be applied to any grating fabrication approach extending the attainable aspect ratios allowing higher energy lab based XPCI systems.
CAMD user meeting Stylus Trap Fabrication Update
Abstract not provided.
Extreme Performance Ion Cavity System Ion Trap Microfabrication
Abstract not provided.
LIGA based very HAR Gratings for XPCI Fabrication enabled by Electrochemical Technique
Abstract not provided.
Tunable Infrared Pixels via Monolithically Integrated Dynamic Graphene Metasurfaces
Abstract not provided.
Low-Voltage LWIR Tunable Transmission Filters Leveraging Graphene Plasmons
Abstract not provided.
Novel Pyrolyzed Carbon Processing and Applications
Abstract not provided.
Double Sided Aligned Si Grating for High Energy X-ray Phase Contrast Imaging
Abstract not provided.
Electroformed Fabrication of Extremely High Aspect Ratio Diffraction Gratings for X-ray Phase Contrast Imaging
Abstract not provided.
Lithographic Development Endpoint Detection Using Electrochemical Techniques
Abstract not provided.
Resonant Ultrathin Infrared Detectors Enabling High Quantum Efficiency
Abstract not provided.
Development of a Passive Capacitive HF Sensor
Abstract not provided.
Resonant Ultrathin Infrared Detectors Enabling High Quantum Efficiency
Abstract not provided.
Defect detection in foams and encapsulants using grating-based x-ray phase contrast imaging
Abstract not provided.
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