Publications

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Microorganisms are ubiquitous in subsurface environments and play a major role in the biogeochemical recycling of various elements. In this paper, we have developed a general approach for a systematic evaluation of microbial impact on the long-term performance of the repository. We have demonstrated that data on microbial population alone are not sufficient for the evaluation of microbial impact on repository performance and a sensible approach for such evaluation must be based on the consideration of environmental constraints on microbial reaction pathways. We have applied our approach to both the Yucca Mountain (YM) repository and the Waste Isolation Pilot Plant (WIPP). We have demonstrated that the effect of microbial activity on the near-field chemistry in the Yucca Mountain repository is negligible because of limited nutrient supply and harsh environmental conditions created by waste emplacement. Whereas for the WIPP, we have shown that, due to the presence of a large quantity of organic materials and nutrients in the wastes, a significant microbial activity can potentially be stimulated and its impact on repository performance can be evaluated with carefully designed incubation experiments coupled with performance assessment calculations. The impact of microbial gas generation on disposal room chemistry in the WIPP can be mitigated by introducing MgO as a backfill material.

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This work reports on the grafting of methyl methacrylate polymer brushes containing spirobenzopyran pendant groups from flat silica surfaces and colloidal particles utilizing atom transfer radical polymerization (ATRP). The reaction conditions were optimized with respect to the kind of surface bound initiator, the type of halide and ligand used in the catalytic complex, the presence/absence of untethered initiator, and solvent type. This enabled synthesis of coatings up to 80 {+-} 3 nm thick with controlled spirobenzopyran content. While polymerization kinetics indicate the presence of chain termination reactions, the 'living' character of the process is confirmed by controlled formation of block copolymer brushes. UV/vis spectroscopy was used to characterize the UV-induced isomerization of spirobenzopyran to zwitterionic merocyanine and the thermal back-reaction. Spectral and kinetic analyses of this latter bleaching process points to the existence of free and associated merocyanines in the polymeric brush in both tetrahydrofuran and toluene. However, stabilization of merocyanine species by the polymer matrix is considerably greater in toluene with thermal back-reaction rates approaching those determined for solid dry films.

Colloidal particles were derivatized with end-grafted polymethylmethacryate polymer brushes containing varying concentrations of spirobenzopyran photochromic molecules. The polymers were grown from initiator-functionalized silica partilces by an atom-transfer radical polymerization (ATRP). These core-shell colloids formed stable suspensions in toluene with the spirobenzopyran in its closed, nonpolar form. However, UV-induced photoswitching of the photochrome to its open, polar merocyanine isomer caused rapid aggregation. The nature of this colloidal stability transition was examined with respect to the spirobenzopyran content in the polymeric brush and solvent polarity. Turbidimetry, wettability studies, UV-vis spectroscopy, suspension rheology, SEM, and visual inspection were utilized to characterize the system photoswitchability. It was found that the system exhibiting the greatest transition in toluene was the copolymer brush composed of 20% spirobenzopyran and 80% methyl methacrylate.

Quartz surfaces and colloidal silica particles were derivatized with a poly(methyl methacrylate) copolymer containing spirobenzopyran (SP) photochromic molecules in the pendant groups at a concentration of 20 mol %. Two-photon near-IR excitation ({approx}780 nm) was then used to create chemically distinct patterns on the modified surfaces through a photochromic process of SP transformation to the zwitterionic merocyanine (MC) isomer. The derivatized colloids were approximately 10 times more likely to adsorb onto the photoswitched, MC regions. Surface coverage and adsorption kinetics have been compared to the mean-field model of irreversible monolayer adsorption.

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This report examines the design process of a photovoltaic (solar) based power supply for wireless sensor networks. Such a system stores the energy produced by an array of photovoltaic cells in a secondary (rechargeable) battery that in turn provides power to the individual node of the sensor network. The goal of such a power supply is to enable a wireless sensor network to have an autonomous operation on the order of years. Ideally, such a system is as small as possible physically while transferring the maximum amount of available solar energy to the load (the node). Within this report, there is first an overview of current solar and battery technologies, including characteristics of different technologies and their impact on overall system design. Second is a general discussion of modeling, predicting, and analyzing the extended operation of a small photovoltaic power supply and setting design parameters. This is followed by results and conclusions from the testing of a few basic systems. Lastly, some advanced concepts that may be considered in order to optimize future systems will be discussed.

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In this paper we present a two-level overlapping domain decomposition preconditioner for the finite-element discretization of elliptic problems in two and three dimensions. The computational domain is partitioned into overlapping subdomains, and a coarse space correction, based on aggregation techniques, is added. Our definition of the coarse space does not require the introduction of a coarse grid. We consider a set of assumptions on the coarse basis functions to bound the condition number of the resulting preconditioned system. These assumptions involve only geometrical quantities associated with the aggregates and the subdomains. We prove that the condition number using the two-level additive Schwarz preconditioner is O(H/{delta} + H{sub 0}/{delta}), where H and H{sub 0} are the diameters of the subdomains and the aggregates, respectively, and {delta} is the overlap among the subdomains and the aggregates. This extends the bounds presented in [C. Lasser and A. Toselli, Convergence of some two-level overlapping domain decomposition preconditioners with smoothed aggregation coarse spaces, in Recent Developments in Domain Decomposition Methods, Lecture Notes in Comput. Sci. Engrg. 23, L. Pavarino and A. Toselli, eds., Springer-Verlag, Berlin, 2002, pp. 95-117; M. Sala, Domain Decomposition Preconditioners: Theoretical Properties, Application to the Compressible Euler Equations, Parallel Aspects, Ph.D. thesis, Ecole Polytechnique Federale de Lausanne, Lausanne, Switzerland, 2003; M. Sala, Math. Model. Numer. Anal., 38 (2004), pp. 765-780]. Numerical experiments on a model problem are reported to illustrate the performance of the proposed preconditioner.

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In recent years, efforts have been made within the nuclear weapons complex (National Nuclear Security Administration) of the Department of Energy (DOE) to replace Resource Conservation and Recovery Act (RCRA) regulated solvents (i.e., flammable, toxic, corrosive, and reactive) and ozone-depleting chemicals (ODC) with more benign alternatives. Within the National Nuclear Security Administration (NNSA) and the Department of Defense (DoD) sectors, these solvents are used for cleaning hardware during routine maintenance operations. A primary goal of this study is to replace flammable solvents used in wiping applications. Two cleaners, including a hydrofluoroether (HFE) and an azeotrope of the HFE and isopropyl alcohol (IPA), have been studied as potential replacements for flammable solvents. Cleaning efficacy, short-term and long-term materials compatibility, corrosion, drying times, flammability, environment, safety and health (ES&H) and accelerated aging issues were among the experiments used to screen candidate solvents by the interagency team performing this work. This report presents cleaning efficacy results as determined by the contact angle Goniometer as well as materials compatibility results of various metal alloys and polymers. The results indicate that IPA (baseline cleaner) and the HFE/IPA azeotrope are roughly equivalent in their ability to remove fluorinated grease, silicone grease, and a simulated finger print contaminant from various metal alloys. All of the ASTM sandwich and immersion corrosion tests with IPA, HFE or the HFE/IPA azeotrope on metal alloys showed no signs of corrosion. Furthermore, no deleterious effects were noted for polymeric materials immersed in IPA, HFE, or the HFE/IPA azeotrope.

The annual program report provides detailed information about all aspects of the SNL/CA Hazardous Materials Management Program for a given calendar year. It functions as supporting documentation to the SNL/CA Environmental Management System Program Manual. The 2005 program report describes the activities undertaken during the past year, and activities planned in future years to implement the Hazardous Materials Management Program, one of six programs that supports environmental management at SNL/CA.

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This manual describes the use of theXyceParallel Electronic Simulator.Xycehasbeen designed as a SPICE-compatible, high-performance analog circuit simulator, andhas been written to support the simulation needs of the Sandia National Laboratorieselectrical designers. This development has focused on improving capability over thecurrent state-of-the-art in the following areas:%04Capability to solve extremely large circuit problems by supporting large-scale par-allel computing platforms (up to thousands of processors). Note that this includessupport for most popular parallel and serial computers.%04Improved performance for all numerical kernels (e.g., time integrator, nonlinearand linear solvers) through state-of-the-art algorithms and novel techniques.%04Device models which are specifically tailored to meet Sandia's needs, includingmany radiation-aware devices.3 XyceTMUsers' Guide%04Object-oriented code design and implementation using modern coding practicesthat ensure that theXyceParallel Electronic Simulator will be maintainable andextensible far into the future.Xyceis a parallel code in the most general sense of the phrase - a message passingparallel implementation - which allows it to run efficiently on the widest possible numberof computing platforms. These include serial, shared-memory and distributed-memoryparallel as well as heterogeneous platforms. Careful attention has been paid to thespecific nature of circuit-simulation problems to ensure that optimal parallel efficiencyis achieved as the number of processors grows.The development ofXyceprovides a platform for computational research and de-velopment aimed specifically at the needs of the Laboratory. WithXyce, Sandia hasan %22in-house%22 capability with which both new electrical (e.g., device model develop-ment) and algorithmic (e.g., faster time-integration methods, parallel solver algorithms)research and development can be performed. As a result,Xyceis a unique electricalsimulation capability, designed to meet the unique needs of the laboratory.4 XyceTMUsers' GuideAcknowledgementsThe authors would like to acknowledge the entire Sandia National Laboratories HPEMS(High Performance Electrical Modeling and Simulation) team, including Steve Wix, CarolynBogdan, Regina Schells, Ken Marx, Steve Brandon and Bill Ballard, for their support onthis project. We also appreciate very much the work of Jim Emery, Becky Arnold and MikeWilliamson for the help in reviewing this document.Lastly, a very special thanks to Hue Lai for typesetting this document with LATEX.TrademarksThe information herein is subject to change without notice.Copyrightc 2002-2003 Sandia Corporation. All rights reserved.XyceTMElectronic Simulator andXyceTMtrademarks of Sandia Corporation.Orcad, Orcad Capture, PSpice and Probe are registered trademarks of Cadence DesignSystems, Inc.Silicon Graphics, the Silicon Graphics logo and IRIX are registered trademarks of SiliconGraphics, Inc.Microsoft, Windows and Windows 2000 are registered trademark of Microsoft Corporation.Solaris and UltraSPARC are registered trademarks of Sun Microsystems Corporation.Medici, DaVinci and Taurus are registered trademarks of Synopsys Corporation.HP and Alpha are registered trademarks of Hewlett-Packard company.Amtec and TecPlot are trademarks of Amtec Engineering, Inc.Xyce's expression library is based on that inside Spice 3F5 developed by the EECS De-partment at the University of California.All other trademarks are property of their respective owners.ContactsBug Reportshttp://tvrusso.sandia.gov/bugzillaEmailxyce-support%40sandia.govWorld Wide Webhttp://www.cs.sandia.gov/xyce5 XyceTMUsers' GuideThis page is left intentionally blank6

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