Chalcogenide Phase Change Materials (PCM) and metal insulator transition (MIT) materials are a group of materials that are capable of switching between low resistance and high resistance states. These emerging materials have been widely used in optical storage media and memory devices. Over the past recent years, there have been interests in exploiting the PCM and MIT materials, especially germanium antimony telluride (GST) alloys and vanadium dioxide (VO2), for radio frequency (RF) applications. The PCM and MIT-based RF devices are expected to bridge the gap between semiconductor switches and microelectromechanical system (MEMS) switches as they combine the low insertion loss performance of MEMS technology and the small size and reliability performance of semiconductor technology. This article presents an overview of the PCM and MIT materials for RF circuits and discusses the recent advancements in reconfigurable millimeter-wave (mmWave) devices based on PCM and MIT materials in depth.
This project developed prototype germanium telluride switches, which can be used in RF applications to improve SWAP (size, weight, and power) and signal quality in RF systems. These switches can allow for highly reconfigurable systems, including antennas, communications, optical systems, phased arrays, and synthetic aperture radar, which all have high impact on current National Security goals for improved communication systems and communication technology supremacy. The final result of the project was the demonstration of germanium telluride RF switches, which could act as critical elements necessary for a single chip RF communication system that will demonstrate low SWAP and high reconfigurability
Plasmas formed in microscale gaps at DC and plasmas formed at radiofrequency (RF) both deviate in behavior compared to the classical Paschen curve, requiring lower voltage to achieve breakdown due to unique processes and dynamics, such as field emission and controlled rates of electron/ion interactions. Both regimes have been investigated independently, using high precision electrode positioning systems for microscale gaps or large, bulky emitters for RF. However, no comprehensive study of the synergistic phenomenon between the two exists. The behavior in such a combined system has the potential to reach sub-10 V breakdown, which combined with the unique electrical properties of microscale plasmas could enable a new class of RF switches, limiters and tuners.This work describes the design and fabrication of novel on-wafer microplasma devices with gaps as small as 100 nm to be operated at GHz frequencies. We used a dual-sacrificial layer process to create devices with microplasma gaps integrated into RF compatible 50 Ω coplanar waveguide transmission lines, which will allow this coupled behaviour to be studied for the first time. These devices are modelled using conventional RF simulations as well as the Sandia code, EMPIRE, which is capable of modelling the breakdown and formation of plasma in microscale gaps driven by high frequencies. Synchronous evaluation of the modelled electrical and breakdown behaviour is used to define device structures, predict behaviour and corroborate results. We further report preliminary independent testing of the microscale gap and RF behaviour. DC testing shows modified-Paschen curve behaviour for plasma gaps at and below four microns, demonstrating decreased breakdown voltage with reduced gap size. Additionally, preliminary S-parameter measurements of as-prepared and connectorized devices have elucidated RF device behaviour. Together, these results provide baseline data that enables future experiments as well as discussion of projected performance and applications for these unique devices.