Substrate-Independent Technique of III-V Heterogeneous Integration of Focal Plane Arrays and Lasers
CLEO: Science and Innovations, CLEO:S and I 2023
We report on a two-step technique for post-bond III-V substrate removal involving precision mechanical milling and selective chemical etching. We show results on GaAs, GaSb, InP, and InAs substrates and from mm-scale chips to wafers.