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Spectroscopy and capacitance measurements of tunneling resonances in an Sb-implanted point contact

Bishop, Nathaniel B.; Stevens, Jeffrey S.; Childs, Kenton D.; Ohlhausen, J.A.; Lilly, Michael L.; Carroll, Malcolm; Young, Ralph W.; Bielejec, Edward S.; Ten Eyck, Gregory A.; Wendt, J.R.; Rahman, Rajib R.; Grubbs, Robert K.

We fabricated a split-gate defined point contact in a double gate enhancement mode Si-MOS device, and implanted Sb donor atoms using a self-aligned process. E-beam lithography in combination with a timed implant gives us excellent control over the placement of dopant atoms, and acts as a stepping stone to focused ion beam implantation of single donors. Our approach allows us considerable latitude in experimental design in-situ. We have identified two resonance conditions in the point contact conductance as a function of split gate voltage. Using tunneling spectroscopy, we probed their electronic structure as a function of temperature and magnetic field. We also determine the capacitive coupling between the resonant feature and several gates. Comparison between experimental values and extensive quasi-classical simulations constrain the location and energy of the resonant level. We discuss our results and how they may apply to resonant tunneling through a single donor.

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TYPE Conference YEAR 2010
OSTI

Double quantum dot with tunable coupling in a Si MOS device with lateral geometry

Lilly, Michael L.; Carroll, Malcolm; Young, Ralph W.; Ten Eyck, Gregory A.; Childs, Kenton D.; Wendt, J.R.; Grubbs, Robert K.

We report low-temperature transport measurements of a silicon metal-oxide-semiconductor (MOS) double quantum dot (DQD). In contrast to previously reported measurements of DQD's in Si MOS structures, our device has a lateral gate geometry very similar to that used by Petta et al. to demonstrate coherent manipulation of single electron spins. This gate design provides a high degree of tunability, allowing for independent control over individual dot occupation and tunnel barriers, as well as the ability to use nearby constrictions to sense dot charge occupation. Comparison of experimentally extracted capacitances between the dot and nearby gates with electrostatic modeling demonstrates the presence of disorder and the ability to partially compensate for this disorder by adjustment of gate voltages. We experimentally show gate-controlled tuning of the interdot coupling over a wide range of energies, an important step towards potential quantum computing applications.

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TYPE Conference YEAR 2010
OSTI

Steps toward fabricating cryogenic CMOS compatible single electron devices for future qubits

Ten Eyck, Gregory A.; Tracy, Lisa A.; Wendt, J.R.; Childs, Kenton D.; Stevens, Jeffrey S.; Lilly, Michael L.; Carroll, Malcolm; Eng, Kevin E.

We describe the development of a novel silicon quantum bit (qubit) device architecture that involves using materials that are compatible with a Sandia National Laboratories (SNL) 0.35 mum complementary metal oxide semiconductor (CMOS) process intended to operate at 100 mK. We describe how the qubit structure can be integrated with CMOS electronics, which is believed to have advantages for critical functions like fast single electron electrometry for readout compared to current approaches using radio frequency techniques. Critical materials properties are reviewed and preliminary characterization of the SNL CMOS devices at 4.2 K is presented.

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TYPE Conference YEAR 2008
OSTI

Germanium-silicon separate absorption and multiplication avalanche photodetectors fabricated with low temperature high density plasma chemical vapor deposited germanium

Materials Research Society Symposium Proceedings

Carroll, Malcolm; Childs, Kenton D.; Serkland, Darwin K.; Jarecki, Robert L.; Bauer, Todd B.; Saiz, Kevin F.

In this paper, we evaluate a commercially available high density plasma chemical vapor deposition (HDP-CVD) process to grow low temperature (i.e., Tin-situ & Tepitaxy < ∼460°C) germanium epitaxy for a p+-Ge/p-Si/n+-Si NIR separate absorption and multiplication avalanche photodetectors (SAM-APD). A primary concern for SAM-APDs in this material system is that high fields will not be sustainable across a highly defective Ge/Si interface. We show Ge-Si SAM-APDs that show avalanche multiplication and avalanche breakdown. A dark current of ∼0.1 mA/cm2 and a 3.2×10-4 A/W responsivity at 1310 nm were measured at punch-through. An over 400x photocurrent multiplication was demonstrated at room temperature. These results indicate that high avalanche multiplication gain is achievable in these Ge/Si heterostructures despite the highly defective interface and therefore trap assisted tunneling through the defective Ge/Si interface is not dominant at high fields. © 2007 Materials Research Society.

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TYPE Conference YEAR 2007
OSTIScopusOSTIScopus
Results 1–25 of 26
Results 1–25 of 26