Membrane projection lithography is extended from a single layer fabrication technique to a multilayer process, adding polymeric backfill and planarization after each layer is completed. Unaligned contact lithography is used as a rapid prototyping tool to aid in process development, patterning resist membranes in seconds without requiring long e-beam write times. The fabricated multilayer structures show good resistance to solvent attack from subsequent process steps and demonstrate in-plane and out of plane multilayer metallic inclusions in a dielectric host, which is a critical step in the path to develop bulklike metamaterials at optical frequencies.
We present a photonic integrated circuit (PIC) composed of two strongly coupled lasers. This PIC utilizes the dynamics of mutual injection locking to increase the relaxation resonance frequency from 3 GHz to beyond 30 GHz.
We present the bandwidth enhancement of an EAM monolithically integrated with two mutually injection-locked lasers. An improvement in the modulation efficiency and bandwidth are shown with mutual injection locking.