Publications

A procedure for quantitative time-of-flight secondary ion mass spectrometry (ToF-SIMS) analysis of the re-oxidation thermally-reduced of iron oxide particles in a ceramic matrix is discussed. Iron oxide is reacted with yttria stabilized zirconia (YSZ) to create a composite that facilitates the high-temperature reduction of CO2 and H2O to produce CO and H2 (syngas). The reactivity of this two-step solar-thermochemical process is being investigated by varying the concentration of iron in YSZ up to and past its solid solubility point, thus affecting the size of iron oxide particles in the matrix, and hence their rate and extent of re-oxidation. YSZ samples containing natural abundance iron oxide were mixed with an organic binder, isostatically pressed into a disc and calcined in air at 1450 °C. The discs (∼ 10 mm diameter, 2 mm thickness) were thermally reduced in inert gas at 1400 °C and then re-oxidized at 1100 °C in the presence of C18O2. The ratio of 18O to 16O shows the extent of oxygen exchange for each iron oxide particle. ToF-SIMS data are acquired in a fashion that maximizes the ability to correct for detector saturation, thus providing quantitative oxygen isotopic results with little error. The data analysis method uses a combination of multivariate analysis for particle identification and conventional analysis for quantitative isotopic ratioing. The results indicate that large iron oxide particles are only poorly utilized, likely due to slow transport, as 18O penetration into the particles is limited. Published 2012. This article is a U.S. Government work and is in the public domain in the USA. © Published 2012. This article is a U.S. Government work and is in the public domain in the USA.

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The Sunshine to Petrol effort at Sandia National Laboratories aims to convert CO 2 and water to liquid hydrocarbon fuel precursors using concentrated solar energy with redox-active metal oxide systems, such as ferrites: Fe 3O 4→3FeO+ 0.5O 2 (>1350°C) 3FeO + CO 2→Fe 3O 4 + CO (<1200°C). However, the ferrite materials are not repeatedly reactive on their own and require a support, such as yttria-stabilized zirconia (YSZ). The ferrite-support interaction is not well defined, as there has been little fundamental characterization of these oxides at the high temperatures and conditions present in these cycles. We have investigated the microstructure, structure-property relationships, and the role of the support on redox behavior of the ferrite composites. In-situ capabilities to elucidate chemical reactions under operating conditions have been developed. The synthesis, structural characterization (room and high- temperature x-ray diffraction, secondary ion mass spectroscopy, scanning electron microscopy), and thermogravimetric analysis of YSZ-supported ferrites will be discussed.

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Hydriding of metals can be routinely performed at high temperature in a rich hydrogen atmosphere. Prior to the hydrogen loading process, a thermal activation procedure is required to promote facile hydrogen sorption into the metal. Despite the wide spread utilization of this activation procedure, little is known about the chemical and electronic changes that occur during activation and how this thermal pretreatment leads to increased rates of hydrogen uptake. This study utilized variable kinetic energy X-ray photoelectron spectroscopy to interrogate the changes during in situ thermal annealing of erbium films, with results confirmed by time-of-flight secondary ion mass spectrometry and low energy ion scattering. Activation can be identified by a large increase in photoemission between the valence band edge and the Fermi level and appears to occur over a two stage process. The first stage involves desorption of contaminants and recrystallization of the oxide, initially impeding hydrogen loading. Further heating overcomes the first stage and leads to degradation of the passive surface oxide leading to a bulk film more accessible for hydrogen loading. © 2011 American Institute of Physics.

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This SAND report documents a late start LDRD designed to determine the possible aging effects of a quartz resonator gold adhesion layer. Sandia uses quartz resonators for applications. These applications require a very stable frequency source with excellent aging (low drift) characteristics. These parts are manufactured by one of our qualified vendors outside Sandia Laboratories, Statek Corp. Over the years we, Sandia and the vendor, have seen aging variations that have not been completely explained by the typical mechanisms known in the industry. One theory was that the resonator metallization may be contributing to the resonator aging. This LDRD would allow us to test and analyze a group of resonators with known differentiating metallization and via accelerated aging determine if a chrome adhesion layer used to accept the final gold plating may contribute to poor aging. We worked with our main vendor to design and manufacture a set of quartz resonators with a wide range of metallization thickness ratios between the chrome and gold that will allow us determine the cause of this aging and which plating thickness ratios provide the best aging performance while not degrading other key characteristics.

Deep reactive ion etching (DRIE) of silicon enables high aspect ratio, deep silicon features that can be incorporated into the fabrication of microelectromechanical systems (MEMS) sensors and actuators. The DRIE process creates silicon structures and consists of three steps: conformal polymer deposition, ion sputtering, and chemical etching. The sequential three step process results in sidewalls with roughness that varies with processing conditions. This paper reports the sidewall roughness for DRIE etched MEMS as a function of trench width from 5 μm to 500 μm for a 125 μm thick device layer corresponding to aspect ratios from 25 to 0.25. Using a scanning electron microscope (SEM), the surfaces were imaged detecting an upper region exhibiting a scalloping morphology and a rougher lower region exhibiting a curtaining morphology. The height of rougher curtaining region increases linearly with aspect ratio when the etch cleared the entire device layer. The surface roughness for two trench widths: 15 μm and 100 μm were further characterized using an atomic force microscope (AFM), and RMS roughness values are reported as a function of height along the surface. The sidewall roughness varies with height and depends on the trench width. Copyright © 2011 by ASME.

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