Publications

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Heteroepitaxy of β-phase gallium oxide (β-Ga₂O₃) thin films on foreign substrates shows promise for the development of next-generation deep ultraviolet solar blind photodetectors and power electronic devices. In this work, the influences of the film thickness and crystallinity on the thermal conductivity of ($\bar{2}01$)-oriented β-Ga₂O₃ heteroepitaxial thin films were investigated. Unintentionally doped β-Ga₂O₃ thin films were grown on c-plane sapphire substrates with off-axis angles of 0° and 6° toward $\langle$$11\bar{2}0$$\rangle$ via metal–organic vapor phase epitaxy (MOVPE) and low-pressure chemical vapor deposition. The surface morphology and crystal quality of the β-Ga₂O₃ thin films were characterized using scanning electron microscopy, X-ray diffraction, and Raman spectroscopy. The thermal conductivities of the β-Ga₂O₃ films were measured via time-domain thermoreflectance. The interface quality was studied using scanning transmission electron microscopy. The measured thermal conductivities of the submicron-thick β-Ga₂O₃ thin films were relatively low as compared to the intrinsic bulk value. The measured thin film thermal conductivities were compared with the Debye–Callaway model incorporating phononic parameters derived from first-principles calculations. The comparison suggests that the reduction in the thin film thermal conductivity can be partially attributed to the enhanced phonon-boundary scattering when the film thickness decreases. They were found to be a strong function of not only the layer thickness but also the film quality, resulting from growth on substrates with different offcut angles. Growth of β-Ga₂O₃ films on 6° offcut sapphire substrates was found to result in higher crystallinity and thermal conductivity than films grown on on-axis c-plane sapphire. However, the β-Ga₂O₃ films grown on 6° offcut sapphire exhibit a lower thermal boundary conductance at the β-Ga₂O₃/sapphire heterointerface. In addition, the thermal conductivity of MOVPE-grown ($\bar{2}01$)-oriented β-(Al_xGa_1–x)₂O₃ thin films with Al compositions ranging from 2% to 43% was characterized. Because of phonon-alloy disorder scattering, the β-(Al_xGa_1–x)₂O₃ films exhibit lower thermal conductivities (2.8–4.7 W/m∙K) than the β-Ga₂O₃ thin films. The dominance of the alloy disorder scattering in β-(Al_xGa_1–x)₂O₃ is further evidenced by the weak temperature dependence of the thermal conductivity. This work provides fundamental insight into the physical interactions that govern phonon transport within heteroepitaxially grown β-phase Ga₂O₃ and (Al_xGa_1–x)₂O₃ thin films and lays the groundwork for the thermal modeling and design of β-Ga₂O₃ electronic and optoelectronic devices.

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We present progress on the synthesis of semimetal Cd₃As₂ by metal–organic chemical-vapor deposition (MOCVD). Specifically, we have optimized the growth conditions needed to obtain technologically useful growth rates and acceptable thin-film microstructures, with our studies evaluating the effects of varying the temperature, pressure, and carrier-gas type for MOCVD of Cd₃As₂ when performed using dimethylcadmium and tertiary-butylarsine precursors. In the course of the optimization studies, exploratory Cd₃As₂ growths are attempted on GaSb substrates, strain-relaxed InAs buffer layers grown on GaSb substrates, and InAs substrates. Notably, only the InAs-terminated substrate surfaces yield desirable results. Extensive microstructural studies of Cd₃As₂ thin films on InAs are performed by using multiple advanced imaging microscopies and x-ray diffraction modalities. The studied films are 5–75 nm in thickness and consist of oriented, coalesced polycrystals with lateral domain widths of 30–80 nm. The most optimized films are smooth and specular, exhibiting a surface roughness as low as 1.0 nm rms. Under cross-sectional imaging, the Cd₃As₂-InAs heterointerface appears smooth and abrupt at a lower film thickness, ~30 nm, but becomes quite irregular as the average thickness increases to ~55 nm. The films are strain-relaxed with a residual biaxial tensile strain (ϵ_xx = +0.0010) that opposes the initially compressive lattice-mismatch strain of Cd₃As₂ coherent on InAs (ϵ_xx = - 0.042). Importantly, phase-identification studies find a thin-film crystal structure consistent with the P4₂/nbc space group, placing MOCVD-grown Cd₃As₂ among the Dirac semimetals of substantial interest for topological quantum materials studies.

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