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Modeling and Assessment of Atomic Precision Advanced Manufacturing (APAM) Enabled Vertical Tunneling Field Effect Transistor

International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

Gao, Xujiao G.; Mendez Granado, Juan P.; Lu, Tzu-Ming L.; Anderson, Evan M.; Campbell, DeAnna M.; Ivie, Jeffrey A.; Schmucker, Scott W.; Grine, Albert D.; Lu, Ping L.; Tracy, Lisa A.; Arghavani, Reza A.; Misra, Shashank M.

The atomic precision advanced manufacturing (APAM) enabled vertical tunneling field effect transistor (TFET) presents a new opportunity in microelectronics thanks to the use of ultra-high doping and atomically abrupt doping profiles. We present modeling and assessment of the APAM TFET using TCAD Charon simulation. First, we show, through a combination of simulation and experiment, that we can achieve good control of the gated channel on top of a phosphorus layer made using APAM, an essential part of the APAM TFET. Then, we present simulation results of a preliminary APAM TFET that predict transistor-like current-voltage response despite low device performance caused by using large geometry dimensions. Future device simulations will be needed to optimize geometry and doping to guide device design for achieving superior device performance.

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FAIR DEAL Grand Challenge Overview

Allemang, Christopher R.; Anderson, Evan M.; Baczewski, Andrew D.; Bussmann, Ezra B.; Butera, Robert E.; Campbell, DeAnna M.; Campbell, Quinn C.; Carr, Stephen M.; Frederick, Esther F.; Gamache, Phillip G.; Gao, Xujiao G.; Grine, Albert D.; Gunter, Mathew M.; Halsey, Connor H.; Ivie, Jeffrey A.; Katzenmeyer, Aaron M.; Leenheer, Andrew J.; Lepkowski, William L.; Lu, Tzu-Ming L.; Mamaluy, Denis M.; Mendez Granado, Juan P.; Pena, Luis F.; Schmucker, Scott W.; Scrymgeour, David S.; Tracy, Lisa A.; Wang, George T.; Ward, Dan W.; Young, Steve M.

While it is likely practically a bad idea to shrink a transistor to the size of an atom, there is no arguing that it would be fantastic to have atomic-scale control over every aspect of a transistor – a kind of crystal ball to understand and evaluate new ideas. This project showed that it was possible to take a niche technique used to place dopants in silicon with atomic precision and apply it broadly to study opportunities and limitations in microelectronics. In addition, it laid the foundation to attaining atomic-scale control in semiconductor manufacturing more broadly.

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High-efficiency thermophotovoltaic energy conversion enabled by a metamaterial selective emitter

Optica

Woolf, David N.; Kadlec, Emil A.; Bethke, Donald T.; Grine, Albert D.; Nogan, John N.; Cederberg, Jeffrey G.; Burckel, D.B.; Luk, Ting S.; Shaner, Eric A.; Hensley, Joel M.

Thermophotovoltaics (TPV) is the process by which photons radiated from a thermal emitter are converted into electrical power via a photovoltaic cell. Selective thermal emitters that can survive at temperatures at or above ∼1000°C have the potential to greatly improve the efficiency of TPV energy conversion by restricting the emission of photons with energies below the photovoltaic (PV) cell bandgap energy. In this work, we demonstrated TPV energy conversion using a high-temperature selective emitter, dielectric filter, and 0.6 eV In0.68 Ga0.32 As photovoltaic cell. We fabricated a passivated platinum and alumina frequency-selective surface by conventional stepper lithography. To our knowledge, this is the first demonstration of TPV energy conversion using a metamaterial emitter. The emitter was heated to >1000°C, and converted electrical power was measured. After accounting for geometry, we demonstrated a thermal-to-electrical power conversion efficiency of 24.1 0.9% at 1055°C. We separately modeled our system consisting of a selective emitter, dielectric filter, and PV cell and found agreement with our measured efficiency and power to within 1%. Our results indicate that high-efficiency TPV generators are possible and are candidates for remote power generation, combined heat and power, and heat-scavenging applications.

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Active Control of Nitride Plasmonic Dispersion in the Far Infrared

Shaner, Eric A.; Dyer, Gregory C.; Seng, William F.; Bethke, Donald T.; Grine, Albert D.; Baca, A.G.; Allerman, A.A.

We investigate plasmonic structures in nitride-based materials for far-infrared (IR) applications. The two dimensional electron gas (2DEG) in the GaN/AlGaN material system, much like metal- dielectric structures, is a patternable plasmonic medium. However, it also permits for direct tunability via an applied voltage. While there have been proof-of-principle demonstrations of plasma excitations in nitride 2DEGs, exploration of the potential of this material system has thus far been limited. We recently demonstrated coherent phenomena such as the formation of plasmonic crystals, strong coupling of tunable crystal defects to a plasmonic crystal, and electromagnetically induced transparency in GaAs/AlGaAs 2DEGs at sub-THz frequencies. In this project, we explore whether these effects can be realized in nitride 2DEG materials above 1 THz and at temperatures exceeding 77 K.

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Single-quantum-well grating-gated terahertz plasmon detectors

Proposed for publication in Applied Physics Letters.

Shaner, Eric A.; Lee, Mark L.; Wanke, Michael W.; Grine, Albert D.; Reno, J.L.

A grating-gated field-effect transistor fabricated from a single-quantum well in a high-mobility GaAs-AlGaAs heterostructure is shown to function as a continuously electrically tunable photodetector of terahertz radiation via excitation of resonant plasmon modes in the well. Different harmonics of the plasmon wave vector are mapped, showing different branches of the dispersion relation. As a function of temperature, the resonant response magnitude peaks at around 30 K. Both photovoltaic and photoconductive responses have been observed under different incident power and bias conditions.

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17 Results
17 Results