Publications

This study examined whether coating system contamination, indicated by poor base pressure, has a negative impact on the laser-induced damage threshold of HfO2/SiO2 high reflection coatings for 527 nm.

We have designed and reported on a dichroic beam combiner coating consisting of HfO2/SiO2 layer pairs to provide high transmission at 527 nm and high reflection at 1054 nm for 22.5° angle of incidence (AOI) in S polarization (Spol). The laser-induced damage threshold (LIDT) of this first coating at the use AOI and polarization with 3.5 nanosecond (ns) pulses at 532 nm is 7 J/cm2, and only marginally adequate for our beam combining application. In this paper, we describe the use of a combination of Al2O3 and HfO2 high index layers to modify the first as well as a second dichroic coating in two different ways, which results in a higher LIDT of 10 J/cm2 for 3.5 ns pulses at 532 nm and 22.5° AOI, Spol for the second dichroic coating, and in the same 7 J/cm2 LIDT for the first dichroic coating.

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Optical coatings with the highest laser damage thresholds rely on clean conditions in the vacuum chamber during the coating deposition process. A low base pressure in the coating chamber, as well as the ability of the vacuum system to maintain the required pressure during deposition, are important aspects of limiting the amount of defects in an optical coating that could induce laser damage. Our large optics coating chamber at Sandia National Laboratories normally relies on three cryo pumps to maintain low pressures for e-beam coating processes. However, on occasion, one or more of the cryo pumps have been out of commission. In light of this circumstance, we decided to explore how deposition under compromised vacuum conditions resulting from the use of only one or two cryo pumps affects the laser-induced damage thresholds of optical coatings. The coatings of this study consist of HfO2 and SiO2 layer materials and include antireflection coatings for 527 nm at normal incidence, and high reflection coatings for 527 nm, 45° angle of incidence (AOI), in P-polarization (P-pol).

We have designed a dichroic beam combiner coating consisting of 11 HfO2/SiO2 layer pairs deposited on a large fused silica substrate. The coating provides high transmission (HT) at 527 nm and high reflection (HR) at 1054 nm for light at 22.5° angle of incidence (AOI) in air in S polarization (Spol). The coating's design is based on layers of near half-wave optical thickness in the design space for stable HT at 527 nm, with layer modifications that provide HR at 1054 nm while preserving HT at 527 nm. Its implementation in the 527 nm/1054 nm dual wavelength beam combiner arrangement has two options, with each option requiring one or the other of the high intensity beams to be incident on the dichroic coating from within the substrate (from glass). We show that there are differences between the two options with respect to the laser-induced damage threshold (LIDT) properties of the coating, and analyze the differences in terms of the 527 nm and 1054 nm E-field intensity behaviors for air → coating and glass → coating incidence. Our E-field analysis indicates that LIDTs for air → coating incidence should be higher than for glass → coating incidence. LIDT measurements for Spol at the use AOI with ns pulses at 532 nm and 1064 nm confirm this analysis with the LIDTs for glass → coating incidence being about half those for air → coating incidence at both wavelengths. These LIDT results and the E-field analysis clearly indicate that the best beam combiner option is the one for which the high intensity 527 nm beam is incident on the coating from air and the 1054 nm high intensity beam is incident on the coating from glass.

We have designed and produced an optical coating suitable for broad bandwidth high reflection (BBHR) at 45° angle of incidence (AOI), P polarization (Ppol) of petawatt (PW) class fs laser pulses of ∼ 900 nm center wavelength. We have produced such BBHR coatings consisting of TiO2/SiO2 layer pairs deposited by ion assisted e-beam evaporation using the large optics coater at Sandia National Laboratories. This paper focuses on laser-induced damage threshold (LIDT) tests of these coatings. LIDT is difficult to measure for such coatings due to the broad range of wavelengths over which they can operate. An ideal test would be in the vacuum environment of the fs-pulse PW use laser using fs pulses identical to of the PW laser. Short of this ideal testing would be tests over portions of the HR band of the BBHR coating using ns or sub-ps pulses produced by tunable lasers. Such tests could be over ∼ 10 nm wide wavelength intervals whose center wavelengths could be tuned over the BBHR coating's operational band. Alternatively, the HR band of the BBHR coating could be adjusted by means of wavelength shifts due to changing the AOI of the LIDT tests or due to absorbed moisture by the coating under ambient conditions. We conduct LIDT tests on the BBHR coatings at selected AOIs to gain insight into the coatings' laser damage properties, and analyze how the results of the different LIDT tests compare.

Reducing contamination is essential for producing optical coatings with high resistance to laser damage. One aspect of this principle is to make every effort to limit long interruptions during the coating's deposition. Otherwise, contamination may accumulate during the pause and become embedded in the coating after the deposition is restarted, leading to a lower laser-induced damage threshold (LIDT). However, pausing a deposition is sometimes unavoidable, despite our best efforts. For example, a sudden hardware or software glitch may require hours or even overnight to solve. In order to broaden our understanding of the role of embedded contamination on LIDT, and determine whether a coating deposited under such non-ideal circumstances could still be acceptable, this study explores how halting a deposition overnight impacts the LIDT, and whether ion cleaning can be used to mitigate any negative effects on the LIDT. The coatings investigated are a beam splitter design for high reflection at 1054 nm and high transmission at 527 nm, at 22.5° angle of incidence in S-polarization. LIDT tests were conducted in the nanosecond regime.

Reducing contamination is essential for producing optical coatings with high resistance to laser damage. One aspect of this principle is to make every effort to limit long interruptions during the coating's deposition. Otherwise, contamination may accumulate during the pause and become embedded in the coating after the deposition is restarted, leading to a lower laser-induced damage threshold (LIDT). However, pausing a deposition is sometimes unavoidable, despite our best efforts. For example, a sudden hardware or software glitch may require hours or even overnight to solve. In order to broaden our understanding of the role of embedded contamination on LIDT, and determine whether a coating deposited under such non-ideal circumstances could still be acceptable, this study explores how halting a deposition overnight impacts the LIDT, and whether ion cleaning can be used to mitigate any negative effects on the LIDT. The coatings investigated are a beam splitter design for high reflection at 1054 nm and high transmission at 527 nm, at 22.5° angle of incidence in S-polarization. LIDT tests were conducted in the nanosecond regime.

This paper describes the modelling and design development of an optical coating that is suitable for broad bandwidth high reflection (BBHR) at 45° angle of incidence (AOI), P polarization (Ppol) and fs-class laser pulses whose frequencies correspond to wavelengths from 800 to 1000 nm, and that can eventually be produced uniformly on meter-class optical substrates. The coating design process was guided by specifications of not only high reflection but also high laser-induced damage threshold (LIDT) as well as low group delay dispersion (GDD) for reflected light over the broad, 200 nm bandwidth in order to minimize temporal broadening of the fs pulses upon reflection. The coating is based on TiO₂/SiO₂layer pairs by means of e-beam evaporation with ion-assisted deposition (IAD). We used OptiLayer Thin Film Software to explore coating designs with a limited optimization process starting from TiO₂/SiO₂ layer pairs with layer thicknesses in an opposite “chirp” arrangement. This approach proved to be successful, leading to a design with R > 99.5% from 801 – 999 nm and GDD < 20 fs² from 843 – 949 nm (45° AOI, Ppol). The GDD behaves in a smooth way that lends itself to compensation of GDD effects. Also, the electric field intensities are favorable to high LIDT in that they quench rapidly into the outer coating layers or are of moderate strength, or they are located in the higher band gap SiO₂ layers.

We have examined how different cleaning processes affect the laser-induced damage threshold of antireflection coatings for large dimension, Z-Backlighter laser optics at Sandia National Laboratories. Laser damage thresholds were measured after the coatings were created, and again 4 months later to determine which cleaning processes were most effective. There is a nearly twofold increase in laser-induced damage threshold between the antireflection coatings that were cleaned and those that were not cleaned. Aging of the coatings after 4 months resulted in even higher laser-induced damage thresholds. Also, the laser-induced damage threshold results revealed that every antireflection coating had a high defect density, despite the cleaning process used, which indicates that improvements to either the cleaning or deposition processes should provide even higher laser-induced damage thresholds.

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When an optical coating is damaged, deposited incorrectly, or is otherwise unsuitable, the conventional method to restore the optic often entails repolishing the optic surface, which can incur a large cost and long lead time. We propose three alternative options to repolishing, including (i) burying the unsuitable coating under another optical coating, (ii) using ion milling to etch the unsuitable coating completely from the optic surface, and then recoating the optic, and (iii) using ion milling to etch through a number of unsuitable layers, leaving the rest of the coating intact, and then recoating the layers that were etched. Repairs were made on test optics with dielectric mirror coatings according to the above three options. The mirror coatings to be repaired were quarter wave stacks of HfO2 and SiO2 layers for high reflection at 1054 nm at 45° incidence in P-polarization. One of the coating layers was purposely deposited incorrectly as Hf metal instead of HfO2 to evaluate the ability of each repair method to restore the coating's high laser-induced damage threshold (LIDT) of 64 J/cm2. The repaired coating with the highest resistance to laser-induced damage was achieved using repair method (ii) with an LIDT of 49-61 J/cm2.

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We optimize reactive, ion-assisted deposition (O2 levels, deposition rate and ion beam settings) using e-beam evaporated Ti for high refractive index, low absorption TiO2 layers and laser damage resistant, broad bandwidth high reflection coatings. © OSA 2013.