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LDRD project 151362 : low energy electron-photon transport

Kensek, Ronald P.; Hjalmarson, Harold P.; Magyar, Rudolph J.; Bondi, Robert J.

At sufficiently high energies, the wavelengths of electrons and photons are short enough to only interact with one atom at time, leading to the popular %E2%80%9Cindependent-atom approximation%E2%80%9D. We attempted to incorporate atomic structure in the generation of cross sections (which embody the modeled physics) to improve transport at lower energies. We document our successes and failures. This was a three-year LDRD project. The core team consisted of a radiation-transport expert, a solid-state physicist, and two DFT experts.

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High-voltage atmospheric breakdown across intervening rutile dielectrics

Simpson, Sean; Coats, Rebecca S.; Hjalmarson, Harold P.; Jorgenson, Roy E.; Pasik, Michael F.

This report documents work conducted in FY13 on electrical discharge experiments performed to develop predictive computational models of the fundamental processes of surface breakdown in the vicinity of high-permittivity material interfaces. Further, experiments were conducted to determine if free carrier electrons could be excited into the conduction band thus lowering the effective breakdown voltage when UV photons (4.66 eV) from a high energy pulsed laser were incident on the rutile sample. This report documents the numerical approach, the experimental setup, and summarizes the data and simulations. Lastly, it describes the path forward and challenges that must be overcome in order to improve future experiments for characterizing the breakdown behavior for rutile.

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Measurement and identification of three contributing charge terms in negative bias temperature instability

ECS Transactions

Mayberry, C.; Nguyen, D.D.; Kouhestani, C.; Kambour, K.E.; Hjalmarson, Harold P.; Devine, R.A.B.

The increase in the magnitude of the threshold voltage of a positive-channel metal oxide semiconductor (PMOS) under negative gate biasing (negative bias temperature instability) is attributed to the build-up of charge in the gate insulator. We have studied the charging and discharging of nitrided SiO2 gate insulator field effect transistors and through the use of pseudo-DC and pulsed stressing methods, have extracted, at least, three charging components. These components are (a) the charging of interface states at the semiconductor/insulator boundary, (b) dynamically recoverable positive charging in the bulk' of the insulator, and (c) positive charging in the insulator, which can be eliminated' only by application of a positive electric field across the insulator. It is proposed that the charge elimination' in (c) arises via a charge neutralization process involving electron capture at switching traps, as opposed to de-trapping, and that this can be reversed by the application of a small negative field. © The Electrochemical Society.

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Results 51–75 of 121
Results 51–75 of 121
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