Atomic Force Microscopy (AFM), in conjunction with Peak Force Kelvin Probe Force Microscopy (PF-KPFM) and Peak Force Scanning Spreading Resistance Microscopy (PF-SSRM), was used to assess changes on thin metal films that underwent accelerated aging. The AFM technique provides a relatively easy, non-destructive methodology that does not require high-vacuum facilities to obtain nanometer-scale spatial resolution of surface chemistry changes. Surface morphology, roughness, contact potential difference, and spreading resistance were monitored to qualitatively identify effects of aging-morphology changes and oxidation of Au, Al, Cu thin film standards as well as diffusion of CuAu and AlAu thin film stacks at 65C under dried nitrogen flow conditions. AFM PF-KPFM and PF-SSRM modes have been exercised, refined and have proven to be viable and necessary early aging detection tools.
The nanometer scale characterization technique of Frequency Modulated Kelvin Probe Force Microscopy (FM-KPFM) will be used to assess a diffusion study on thin metal films that undergo accelerated aging. The KPFM technique provides a relatively easy, non-destructive methodology that does not require high-vacuum facilities to obtain nanometer-scale spatial resolution of surface chemistry changes. The KPFM technique will be exercised in an effort to explore its capacity to map surface potential contrast caused by diffusion in a manner that allows for a qualitative assessment of diffusion of Cu or Al through Au. Supporting data will be obtained from traditional techniques: AES, XPS and UPS. An aging study was conducted on thin metal test specimens comprised of 500nm Cu or Al then 500nm Au on Si. The accelerated aging process was performed under inert conditions at aging temperatures of 100°C for Cu/Au film stack and 175°C for Al/Au film stack at aging times of 8 hours, 24 hours, 96 hours (4 days), and 216 hours (9 days).A calibration method was developed using Au, Al and Cu standards to establish precision and repeatability of the KPFM technique. The average Contact Potential Difference (CPD)s and standard deviations for each metal were found and summarized. Averages from surface roughness of the AFM topography images and roughness analysis of KPFM potential images which yield an average CPD of each area of unaged vs aged coupon surfaces were compared and show trends that indicate surface chemistry.
The National Rotor Testbed (NRT) is a wind turbine blade research program in the Sandia National Laboratories (SNL) Wind Department that has developed a new blade design. Each blade includes bonded-in, threaded metal root inserts that enable the blades to be bolted onto the wind turbine hub. Prior to installing the flight blades on the turbine, root insert strength verification tests exhibited a subset of failures below the design load on one (NRT-02) of four blades. As part of a root cause analysis for the failures, this work analyzes "scraps" of the epoxy adhesive used to bond the metal inserts into the blade and uses surface topography and x-ray fluorescence (XRF) measurements to characterize the exterior surface of the root insert. Samples were taken from inserts that exhibited both high and low loads at failure, as well as some "control inserts" to monitor the state of the surface throughout the manufacturing process. Differences in the calorimetric response of the adhesive from the separate root inserts are apparent but none of them appear to relate to the pull load required to dislodge the inserts. Two takeaways of note include: In the way that the adhesive is processed, it does not reach full cure; and, Something occurred to sample#10 such that the fully-cured adhesive has a significantly lower Tg.
The nanometer scale characterization technique of Frequency Modulated Kelvin Probe Force Microscopy (FM-KPFM) will be used to assess a preliminary diffusion study on thin metal films that undergo accelerated aging. The KPFM technique provides a relatively easy, non-destructive methodology that does not require high-vacuum facilities to obtain nanometer spatial resolution of surface chemistry changes and will be exercised in an effort to explore its capacity to map surface potential contrast caused by Cu diffusion in a manner that allows for a qualitative assessment of diffusion rate kinetics. Supporting data will be obtained from traditional techniques: AES, XPS and UPS. An aging study was conducted on thin metal test specimens comprised of Ti or Cr/Cu/Au layer thicknesses of 50nm/500nm/500nm up to 4μm respectively. The accelerated aging process, was performed in air at aging temperatures of 60°C, 100°C, and 125°C for aging times of 8 hours, 24 hours, 96 hours (4 days), and 216 hours (9 days). A calibration method was developed using Au, Al and Ni standards to establish precision and repeatability of the KPFM technique. Average CPDs and standard deviations for each metal were found and summarized.
Materials aging is a high-consequence failure mode in electronic systems. Such mechanisms can degrade the electrical properties of connectors, relays, wire bonds, and other interconnections. Lost performance will impact, not only that of the device, but also the function and reliability of next-level assemblies and the weapons system as a whole. The detections of changes to materials surfaces at the nanometer-scale resolution, provides a means to identify aging processes at their early stages before they manifest into latent failures that affect system-level performance and reliability. Diffusion will be studied on thin films that undergo accelerated aging using the nanometer scale characterization technique of Frequency Modulated Kelvin Probe Force Microscopy (FM-KPFM). The KPFM provides a relatively easy, non-destructive methodology that does not require high-vacuum facilities to obtain nanometer spatial resolution of surface chemistry changes. The KPFM method can provide the means to measure surface, and near-surface, elemental concentrations that allow the determination of diffusion rate kinetics. These attributes will be illustrated by assessing diffusion in a thin film couple. Validation data will obtained from traditional techniques: (a) Auger electron spectroscopy (AES), x-ray fluorescence (XRF), and xray photoelectron spectroscopy (XPS).
Materials aging is a high-consequence failure mode in electronic systems. Such mechanisms can degrade the electrical properties of connectors, relays, wire bonds, and other interconnections. Lost performance will impact, not only that of the device, but also the function and reliability of next-level assemblies and the weapons system as a whole. The detections of changes to materials surfaces at the nanometer-scale resolution, provides a means to identify aging processes at their early stages before they manifest into latent failures that affect system-level performance and reliability. Diffusion will be studied on thin films that undergo accelerated aging using the nanometer scale characterization technique of Frequency Modulated Kelvin Probe Force Microscopy (FM-KPFM). The KPFM provides a relatively easy, non-destructive methodology that does not require high-vacuum facilities to obtain nanometer spatial resolution of surface chemistry changes. The KPFM method can provide the means to measure surface, and near-surface, elemental concentrations that allow the determination of diffusion rate kinetics. These attributes will be illustrated by assessing diffusion in a thin film couple. Validation data will obtained from traditional techniques: (a) Auger electron spectroscopy (AES), x-ray fluorescence (XRF), and xray photoelectron spectroscopy (XPS).
To quantify the resolution limits of scanning microwave impedance microscopy (sMIM), we created scanning tunneling microscope (STM)-patterned donor nanostructures in silicon composed of 10 nm lines of highly conductive silicon buried under a protective top cap of silicon, and imaged them with sMIM. This dopant pattern is an ideal test of the resolution and sensitivity of the sMIM technique, as it is made with nm-resolution and offers minimal complications from topography convolution. It has been determined that typical sMIM tips can resolve lines down to ∼80 nm spacing, while resolution is independent of tip geometry as extreme tip wear does not change the resolving power, contrary to traditional scanning capacitance microscopy (SCM). Going forward, sMIM is an ideal technique for qualifying buried patterned devices, potentially allowing for quantitative post-fabrication characterization of donor structures, which may be an important tool for the study of atomic-scale transistors and state of the art quantum computation schemes.
Replicating compounds are used to cast reproductions of surface features on a variety of materials. Replicas allow for quantitative measurements and recordkeeping on parts that may otherwise be difficult to measure or maintain. In this study, the chemistry and replicating capability of several replicating compounds was investigated. Additionally, the residue remaining on material surfaces upon removal of replicas was quantified. Cleaning practices were tested for several different replicating compounds. For all replicating compounds investigated, a thin silicone residue was left by the replica. For some compounds, additional inorganic species could be identified in the residue. Simple solvent cleaning could remove some residue.