Qubits demonstrated using GaAs double quantum dots (DQD). The qubit basis states are the (1) singlet and (2) triplet stationary states. Long spin decoherence times in silicon spurs translation of GaAs qubit in to silicon. In the near term the goals are: (1) Develop surface gate enhancement mode double quantum dots (MOS & strained-Si/SiGe) to demonstrate few electrons and spin read-out and to examine impurity doped quantum-dots as an alternative architecture; (2) Use mobility, C-V, ESR, quantum dot performance & modeling to feedback and improve upon processing, this includes development of atomic precision fabrication at SNL; (3) Examine integrated electronics approaches to RF-SET; (4) Use combinations of numerical packages for multi-scale simulation of quantum dot systems (NEMO3D, EMT, TCAD, SPICE); and (5) Continue micro-architecture evaluation for different device and transport architectures.
We have compared simulations using solutions of Poisson's equation to detailed capacitance measurements on a double quantum dot structure. We tabulate the results and show which cases show good agreement and which do not. The capacitance values are also compared to those calculated by a solution of Laplace's equation. Electron density is plotted and discussed. In order to understand relevant potential barriers we compare simulations at 50 Kelvin to simulations at 15 Kelvin. We show that the charge density does not differ greatly, but that the conduction band potential does. However, a method of estimating the potential at 0 Kelvin based on the charge distribution at 50 Kelvin is shown to be close to the potential at 15 Kelvin. This method was used to estimate potential barriers at 0 Kelvin in two quantum dot structures.
We report low-temperature transport measurements of a silicon metal-oxide-semiconductor (MOS) double quantum dot (DQD). In contrast to previously reported measurements of DQD's in Si MOS structures, our device has a lateral gate geometry very similar to that used by Petta et al. to demonstrate coherent manipulation of single electron spins. This gate design provides a high degree of tunability, allowing for independent control over individual dot occupation and tunnel barriers, as well as the ability to use nearby constrictions to sense dot charge occupation. Comparison of experimentally extracted capacitances between the dot and nearby gates with electrostatic modeling demonstrates the presence of disorder and the ability to partially compensate for this disorder by adjustment of gate voltages. We experimentally show gate-controlled tuning of the interdot coupling over a wide range of energies, an important step towards potential quantum computing applications.
We fabricated a split-gate defined point contact in a double gate enhancement mode Si-MOS device, and implanted Sb donor atoms using a self-aligned process. E-beam lithography in combination with a timed implant gives us excellent control over the placement of dopant atoms, and acts as a stepping stone to focused ion beam implantation of single donors. Our approach allows us considerable latitude in experimental design in-situ. We have identified two resonance conditions in the point contact conductance as a function of split gate voltage. Using tunneling spectroscopy, we probed their electronic structure as a function of temperature and magnetic field. We also determine the capacitive coupling between the resonant feature and several gates. Comparison between experimental values and extensive quasi-classical simulations constrain the location and energy of the resonant level. We discuss our results and how they may apply to resonant tunneling through a single donor.
The observation and characterization of a single atom system in silicon is a significant landmark in half a century of device miniaturization, and presents an important new laboratory for fundamental quantum and atomic physics. We compare with multi-million atom tight binding (TB) calculations the measurements of the spectrum of a single two-electron (2e) atom system in silicon - a negatively charged (D-) gated Arsenic donor in a FinFET. The TB method captures accurate single electron eigenstates of the device taking into account device geometry, donor potentials, applied fields, interfaces, and the full host bandstructure. In a previous work, the depths and fields of As donors in six device samples were established through excited state spectroscopy of the D0 electron and comparison with TB calculations. Using self-consistent field (SCF) TB, we computed the charging energies of the D- electron for the same six device samples, and found good agreement with the measurements. Although a bulk donor has only a bound singlet ground state and a charging energy of about 40 meV, calculations show that a gated donor near an interface can have a reduced charging energy and bound excited states in the D- spectrum. Measurements indeed reveal reduced charging energies and bound 2e excited states, at least one of which is a triplet. The calculations also show the influence of the host valley physics in the two-electron spectrum of the donor.
The readout of a solid state qubit often relies on single charge sensitive electrometry. However the combination of fast and accurate measurements is non trivial due to large RC time constants due to the electrometers resistance and shunt capacitance from wires between the cold stage and room temperature. Currently fast sensitive measurements are accomplished through rf reflectrometry. I will present an alternative single charge readout technique based on cryogenic CMOS circuits in hopes to improve speed, signal-to-noise, power consumption and simplicity in implementation. The readout circuit is based on a current comparator where changes in current from an electrometer will trigger a digital output. These circuits were fabricated using Sandia's 0.35 {micro}m CMOS foundry process. Initial measurements of comparators with an addition a current amplifier have displayed current sensitivities of < 1nA at 4.2K, switching speeds up to {approx}120ns, while consuming {approx}10 {micro}W. I will also discuss an investigation of noise characterization of our CMOS process in hopes to obtain a better understanding of the ultimate limit in signal to noise performance.
Constructing high-fidelity control pulses that are robust to control and system/environment fluctuations is a crucial objective for quantum information processing (QIP). We combine dynamical decoupling (DD) with optimal control (OC) to identify control pulses that achieve this objective numerically. Previous DD work has shown that general errors up to (but not including) third order can be removed from {pi}- and {pi}/2-pulses without concatenation. By systematically integrating DD and OC, we are able to increase pulse fidelity beyond this limit. Our hybrid method of quantum control incorporates a newly-developed algorithm for robust OC, providing a nested DD-OC approach to generate robust controls. Motivated by solid-state QIP, we also incorporate relevant experimental constraints into this DD-OC formalism. To demonstrate the advantage of our approach, the resulting quantum controls are compared to previous DD results in open and uncertain model systems.
Development of silicon, enhancement mode nanostructures for solid-state quantum computing will be described. A primary motivation of this research is the recent unprecedented manipulation of single electron spins in GaAs quantum dots, which has been used to demonstrate a quantum bit. Long spin decoherence times are predicted possible in silicon qubits. This talk will focus on silicon enhancement mode quantum dot structures that emulate the GaAs lateral quantum dot qubit but use an enhancement mode field effect transistor (FET) structure. One critical concern for silicon quantum dots that use oxides as insulators in the FET structure is that defects in the metal oxide semiconductor (MOS) stack can produce both detrimental electrostatic and paramagnetic effects on the qubit. Understanding the implications of defects in the Si MOS system is also relevant for other qubit architectures that have nearby dielectric passivated surfaces. Stable, lithographically defined, single-period Coulomb-blockade and single-electron charge sensing in a quantum dot nanostructure using a MOS stack will be presented. A combination of characterization of defects, modeling and consideration of modified approaches that incorporate SiGe or donors provides guidance about the enhancement mode MOS approach for future qubits and quantum circuit micro-architecture.
Silicon is an ideal system for investigating single electron or isolated donor spins for quantum computation, due to long spin coherence times. Enhancement mode strained-silicon/silicon germanium (sSi/SiGe) devices would offer an as-yet untried path toward electron or electron/donor quantum dot systems. Thin, undoped SiGe dielectrics allow tight electrostatic confinement, as well as potential Lande g-factor engineered spin manipulation. In this talk we summarize recent progress toward sSi/SiGe enhancement mode devices on sSi on insulator, including characterization with X-ray diffraction and atomic force microscopy, as well as challenges faced and progress on integration of either top-down and bottom-up donor placement approaches in a sSi/SiGe enhancement mode structure.