Low-Temperature Processing for Atomically Precise Dopant Incorporation with CMOS Integration
Schmucker, Scott W.; Anderson, Evan M.; Frederick, Esther F.; Ivie, Jeffrey A.; Bussmann, Ezra B.; Campbell, DeAnna M.; Tracy, Lisa A.; Lu, Tzu-Ming L.; Lu, Ping L.; Wang, George T.; Ward, Daniel R.; Misra, Shashank M.
Abstract not provided.