Publications Details

Publications / Conference Presenation

Path towards a vertical TFET enabled by atomic precision advanced manufacturing

Lu, Tzu-Ming L.; Gao, Xujiao G.; Anderson, Evan M.; Mendez Granado, Juan P.; Campbell, DeAnna M.; Ivie, Jeffrey A.; Schmucker, Scott W.; Grine, Albert D.; Lu, Ping L.; Tracy, Lisa A.; Arghavani, Reza A.; Misra, Shashank M.

We propose a vertical TFET using atomic precision advanced manufacturing (APAM) to create an abrupt buried n++-doped source. We developed a gate stack that preserves the APAM source to accumulate holes above it, with a goal of band-to-band tunneling (BTBT) perpendicular to the gate – critical for the proposed device. A metal-insulator-semiconductor (MIS) capacitor shows hole accumulation above the APAM source, corroborated by simulation, demonstrating the TFET’s feasibility.