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Reduced temperature preparation of atomically clean Si surfaces to augment CMOS with atomic precision devices

Anderson, Evan M.; Pena, Luis F.; Frederick, Esther; Mudrick, John P.; Campbell, Deanna M.; Katzenmeyer, Aaron M.; Lu, Tzu M.; Leenheer, Andrew J.; Ivie, Jeffrey A.; Schmucker, Scott W.; Scrymgeour, David; Misra, Shashank

Abstract not provided.