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Direct Integration of Atomic Precision Devices into a MOS-Compatible Process

Ivie, Jeffrey A.; Campbell, DeAnna M.; Leenheer, Andrew J.; Halsey, Connor H.; Anderson, Evan M.; Schmucker, Scott W.; Scrymgeour, David S.; Gao, Xujiao G.; Lepkowski, William L.; Lu, Tzu-Ming L.; Tracy, Lisa A.; Misra, Shashank M.

Abstract not provided.