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Direct Integration of Atomic Precision Devices into a MOS-Compatible Process

Ivie, Jeffrey A.; Campbell, Deanna M.; Leenheer, Andrew J.; Halsey, Connor; Anderson, Evan M.; Schmucker, Scott W.; Scrymgeour, David; Gao, Xujiao; Lepkowski, William; Lu, Tzu M.; Tracy, Lisa A.; Misra, Shashank

Abstract not provided.