Publications Details

All-optical lithography process for contacting nanometer precision donor devices

Ward, Daniel R.; Marshall, Michael T.; Campbell, DeAnna M.; Lu, Tzu-Ming L.; Laros, James H.; Scrymgeour, David S.; Bussmann, Ezra B.; Misra, Shashank M.

We describe an all-optical lithography process that can make electrical contact to nanometer-precision donor devices fabricated in silicon using scanning tunneling microscopy (STM). This is accomplished by implementing a cleaning procedure in the STM that allows the integration of metal alignment marks and ion-implanted contacts at the wafer level. Low-temperature transport measurements of a patterned device establish the viability of the process.