Publications Details

All-optical lithography process for contacting nanometer precision donor devices

Ward, Daniel R.; Marshall, Michael; Campbell, Deanna M.; Lu, Tzu M.; Foulk, James W.; Scrymgeour, David; Bussmann, Ezra; Misra, Shashank

We describe an all-optical lithography process that can make electrical contact to nanometer-precision donor devices fabricated in silicon using scanning tunneling microscopy (STM). This is accomplished by implementing a cleaning procedure in the STM that allows the integration of metal alignment marks and ion-implanted contacts at the wafer level. Low-temperature transport measurements of a patterned device establish the viability of the process.