Publications Details
Reactive Sputtering of Sub-Stoichiometric Ta2O5-x for Resistive Memory Applications
Lohn, Andrew J.; Mickel, Patrick R.; Doyle, B.L.; Marinella, Matthew; Stevens, James E.
Abstract not provided.
Lohn, Andrew J.; Mickel, Patrick R.; Doyle, B.L.; Marinella, Matthew; Stevens, James E.
Abstract not provided.