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High speed optical filtering using active resonant subwavelength gratings

Proceedings of SPIE - The International Society for Optical Engineering

Gin, A.V.; Kemme, S.A.; Boye, Robert B.; Peters, D.W.; Ihlefeld, Jon I.; Briggs, R.D.; Wendt, J.R.; Ellis, A.R.; Marshall, L.H.; Carter, T.R.; Hunker, J.D.; Samora, S.

In this work, we describe the most recent progress towards the device modeling, fabrication, testing and system integration of active resonant subwavelength grating (RSG) devices. Passive RSG devices have been a subject of interest in subwavelength-structured surfaces (SWS) in recent years due to their narrow spectral response and high quality filtering performance. Modulating the bias voltage of interdigitated metal electrodes over an electrooptic thin film material enables the RSG components to act as actively tunable high-speed optical filters. The filter characteristics of the device can be engineered using the geometry of the device grating and underlying materials. Using electron beam lithography and specialized etch techniques, we have fabricated interdigitated metal electrodes on an insulating layer and BaTiO3 thin film on sapphire substrate. With bias voltages of up to 100V, spectral red shifts of several nanometers are measured, as well as significant changes in the reflected and transmitted signal intensities around the 1.55um wavelength. Due to their small size and lack of moving parts, these devices are attractive for high speed spectral sensing applications. We will discuss the most recent device testing results as well as comment on the system integration aspects of this project. © 2010 Copyright SPIE - The International Society for Optical Engineering.

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Adsorption-controlled growth of BiFeO3 by MBE and integration with wide band gap semiconductors

Proposed for publciation in IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control.

Ihlefeld, Jon I.

BiFeO3 thin films have been deposited on (101) DyScO3, (0001) AlGaN/GaN, and (0001) SiC single crystal substrates by reactive molecular-beam epitaxy in an adsorption-controlled growth regime. This is achieved by supplying a bismuth over-pressure and utilizing the differential vapor pressures between bismuth oxides and BiFeO3 to control stoichiometry. Four-circle x-ray diffraction reveals phase-pure, epitaxial films with rocking curve full width at half maximum values as narrow as 7.2 arc seconds. Epitaxial growth of (0001)-oriented BiFeO3 thin films on (0001) GaN, including AlGaN HEMT structures, and (0001) SiC has been realized utilizing intervening epitaxial (111) SrTiO3/(100) TiO2 buffer layers. The epitaxial BiFeO3 thin films have two in-plane orientations: [1120] BiFeO3 [1120] GaN (SiC) plus a twin variant related by a 180{sup o} in-plane rotation. This epitaxial integration of the ferroelectric with the highest known polarization, BiFeO3, with wide band gap semiconductors is an important step toward novel field-effect devices.

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Results 201–204 of 204
Results 201–204 of 204