Publications

Frederick, E., Campbell, Q., Kolesnichenko, I.V., Pena, L.F., Benavidez, A., Anderson, E.M., Wheeler, D.R., & Misra, S. (2021). Ultradoping Boron on Si(100) via Solvothermal Chemistry**. Chemistry - A European Journal, 27(53), pp. 13337-13341. 10.1002/chem.202102200

Frederick, E., Dwyer, K.J., Gaskell, K., Wang, G.T., Misra, S., & Butera, R.E. (2021). The stability of Cl-, Br-, and I-passivated Si(100)-(2 × 1) in ambient environments for atomically-precise pattern preservation. Journal of Physics. Condensed Matter, 33(44). https://doi.org/10.1088/1361-648x/ac1aa4

Appelhans, L., Hughes, L., McKenzie, B., Rodriguez, M.A., Griego, J.G., Briscoe, J., Moorman, M.W., Frederick, E., & Wright, J.B. (2021). Facile microwave synthesis of zirconium metal-organic framework thin films on gold and silicon and application to sensor functionalization. Microporous and Mesoporous Materials, 323. 10.1016/j.micromeso.2021.111133

Schmucker, S.W., Frederick, E., Campbell, Q., Ivie, J.A., Anderson, E.M., Dwyer, K., Baczewski, A.D., Wang, G.T., Butera, R., & Misra, S. (2021). Atomic Precision Advanced Manufacturing and Lessons for Area-Selective Deposition [Conference Presentation]. 10.2172/1877517

Anderson, E.M., Pena, L.F., Frederick, E., Mudrick, J.P., Campbell, D.M., Katzenmeyer, A.M., Lu, T.M., Leenheer, A.J., Ivie, J.A., Schmucker, S.W., Scrymgeour, D., & Misra, S. (2021). Reduced temperature preparation of atomically clean Si surfaces to augment CMOS with atomic precision devices [Conference Presentation]. 10.2172/1870755

Frederick, E., Campbell, Q., Benavidez, A., Kolesnichenko, I.V., Pena, L.F., Anderson, E.M., Wheeler, D.R., & Misra, S. (2021). Solvothermal Chemistry to ?Ultradope? Si(100) [Conference Presentation]. 10.2172/1877798

Scrymgeour, D., Frederick, E., Halsey, C., Campbell, D.M., Anderson, E.M., Schmucker, S.W., Ivie, J.A., Gao, X., Lu, T.M., Tracy, L.A., & Misra, S. (2021). Atomic precision advanced manufacturing (APAM) of ultra-doped nanostructures for advanced CMOS devices and interconnects [Conference Presentation]. 10.2172/1863854

Schmucker, S.W., Anderson, E.M., Frederick, E., Ivie, J.A., Bussmann, E., Campbell, D.M., Tracy, L.A., Lu, T.M., Lu, P., Wang, G.T., Ward, D., & Misra, S. (2020). Low-Temperature Processing for Atomically Precise Dopant Incorporation with CMOS Integration [Conference Presentation]. 10.2172/1830910

Pattyn, C.A., Appelhans, L., Briscoe, J., Hughes, L., McKenzie, B., Rodriguez, M.A., Moorman, M.W., Frederick, E., Vreeland, E., Huber, D.L., Westlake, K., Chavez, A.J., & Wright, J.B. (2020). Chemical Warfare Agent Detection Using Zirconium Metal-Organic Framework Functionalized Plasmonic Sensors [Conference Poster]. https://www.osti.gov/biblio/1821844

Wang, G.T., Katzenmeyer, A.M., Schmucker, S.W., & Frederick, E. (2020). FAIR DEAL GC Thrust 4: APAM Toolbox [Presentation]. https://www.osti.gov/biblio/1808428

Frederick, E. (2020). Wet Chemistry Methods to Dope Si(100) [Presentation]. https://www.osti.gov/biblio/1787722

Frederick, E., Kolesnichenko, I.V., Wheeler, D.R., Benavidez, A., Lambert, T.N., Wang, G.T., & Misra, S. (2019). Monolayer Doping of Si(100) [Presentation]. https://www.osti.gov/biblio/1761052

Frederick, E., Kolesnichenko, I.V., Wheeler, D.R., Lambert, T.N., Benavidez, A., Misra, S., & Wang, G.T. (2019). Molecular Doping of Si(100) using Soft Lithography [Conference Poster]. https://www.osti.gov/biblio/1642964

Frederick, E., Kolesnichenko, I.V., Wheeler, D.R., & Wang, G.T. (2019). Wet Chemistry: doping H-Si with boron precursors [Presentation]. https://www.osti.gov/biblio/1700537