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The growth and doping of Al(As)Sb by metal-organic chemical vapor deposition
AlSb and AlAs{sub x}Sb{sub 1{minus}x} epitaxial films grown by metal-organic chemical vapor deposition were successfully doped p- or n-type using diethylzinc or tetraethyltin, respectively. AlSb films were grown at 500 C and 76 torr using trimethylamine or ethyldimethylamine alane and triethylantimony. The authors examined the growth of AlAsSb using temperature of 500 to 600 C, pressures of 65 to 630 torr, V/III ratios of 1--17, and growth rates of 0.3 to 2.7 {micro}m/hour in a horizontal quartz reactor. SIMS showed C and O levels below 2 {times} 10{sup 18} cm{sup {minus}3} and 6 {times} 10{sup 18} cm{sup {minus}3} respectively for undoped AlSb. Similar levels of O were found in AlAs{sub 0.16}Sb{sub 0.84} films but C levels were an order of magnitude less in undoped and Sn-doped AlAs{sub 0.16}Sb{sub 0.84} films. Hall measurements of AlAs{sub 0.16}Sb{sub 0.84} showed hole concentrations between 1 {times} 10{sup 17} cm{sup {minus}3} to 5 {times} 10{sup 18} cm{sup {minus}3} for Zn-doped material and electron concentrations in the low to mid 10{sup 18} cm{sup {minus}3} for Sn-doped material. They have grown pseudomorphic InAs/InAsSb quantum well active regions on AlAsSb cladding layers. Photoluminescence of these layers has been observed up to 300 K.