Publications Details
Initial development of efficient, low-debris laser targets for the Sandia soft x-ray projection lithography effort
During the fiscal years 92-94 a joint group from Sandia/New Mexico and Sandia/California studied the development of new laser-plasma targets for projection x-ray or EUV (extreme ultraviolet) lithography. Our experimental and theoretical analyses incorporated target design as an integral part of the lithographic optical system. Targets studied included thick solid targets, thin-foil metal-coated targets, and cryogenic targets. Our complete measurement suite consisted of x-ray conversion efficiency measurements, source size imaging, source x-ray angular distribution measurements, debris collection, and source EUV spectrum. Target evaluation also included the variation of laser characteristics, such as, laser intensity, spot size, wavelength, pulselength, and pulseshape. Over the course of these experiments we examined targets using KrF (248nm), XeCl (308nm), and CO{sub 2} (10.6 {mu}m) lasers. While debris issues now dominate research in this area, final details were concluded on our understanding of material spectra and radiation transport of 13 run light in laser-plasmas. Additionally, conclusive results were obtained with 308 rim light, showing the pulselength threshold below which plumes no longer limited the transmission of (and thus the conversion efficiency to) 13 nm radiation.