Publications Details
Trace water determination in gases by infrared spectroscopy
Water determination in semiconductor process gases is desirable in order to extend the life of gas delivery systems and improve wafer yields. We review our work in applying Fourier transform infrared spectroscopy to this problem, where a 10 ppb detection limit has been demonstrated for water in N2, HCl, and HBr. The potential for optical determination of other contaminants in these gases is discussed. Also, alternative optical spectroscopic approaches are briefly described. Finally, we discuss methods for dealing with interference arising from water in the instrument beam path, yet outside the sample cell.