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The deposition characteristics of copper(I) compounds for CVD by FT-IR spectroscopy

Hardcastle, F.D.

Fourier transform-infrared spectroscopy (FT-IR) was used to investigate the adsorption and thermally-induced decomposition of copper (I) {beta}-diketonate precursors of the type (hfac)CuL, where hfac is the hexafluoroacetylacetonate bidentate ligand and L is trimethylphosphine or 1,5-cyclooctadiene. The (hfac)CuPMe{sub 3} precursor desorbs from the surface at very low temperatures whereas the (hfac)Cu(1,5-COD) dissociates on adsorption, liberating 1,5-COD and leaving a surface(hfac)Cu complex which can subsequently disproportionate. Evidence is provided for hydrogen-bonding between the hfac ligand and the surface silanols for (hfac)CuPMe{sub 3}, but not for (hfac)Cu(1,5-COD). These results are consistent with the selective behavior of these precursors for copper deposition and suggest that the selectivity of the (hfac)CuPMe{sub 3} and (hfac)Cu(1, 5-COD) precursors may be due to the ability of the hfac ligand to hydrogen bond to the surface silanol groups.