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Smooth, low-damage, definition of InGaAlAs asymmetric Fabry-Perot optical transmission modulators by Cl{sub 2}+Ar reactive-ion-beam etching

Vawter, G.A.; Fritz, I.J.; Drummond, T.J.; Lee, S.R.; Hafich, M.J.; Howard, A.J.; Briggs, R.D.; Casalnuovo, S.A.; Griego, L.

Chlorine-argon-based reactive-ion-beam etching was used successfully to etch novel InGaAlAs (1.32 {mu}m-wavelength Fabry-Perot resonator transmission) modulators. Resulting etch is very smooth, anisotropic, and has low etch-induced (sidewall) damage. Use of this simple chemistry eliminates difficulties with polymer formation encountered in hydrocarbon-based etches.