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Selective, pulsed CVD of platinum on microfilament gas sensors

Manginell, R.P.; Smith, J.H.; Ricco, A.J.; Moreno, D.J.; Hughes, R.C.; Huber, R.J.; Senturia, S.D.

A post-processing, selective micro-chemical vapor deposition (``micro-CVD``) technology for the deposition of catalytic films on surface-micromachined, nitride-passivated polysilicon filaments has been investigated. Atmospheric pressure deposition of Pt on microfilaments was accomplished by thermal decomposition of Pt acetylacetonate; deposition occurs selectively only on those filaments which are electrically heated. Catalyst morphology, characterized by SEM, can be controlled by altering deposition time, filament temperature, and through the use of pulsed heating of the filament during deposition. Morphology plays an important role in determining the sensitivity of these devices when used as combustible gas sensors.