Publications Details

Release-etch modeling for complex surface-micromachined structures

Eaton, W.P.; Smith, J.H.; Jarecki, R.L.

A release etch model for etching sacrificial oxides in aqueous HF solutions is presented. This model is an extension of work done by Monk et. al. and Liu et. al The model is inherently one dimensional, but can be used to model the etching of complex three dimensional parts. Solutions and boundary conditions are presented for a number of geometries.