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Reactive, ion-assisted deposition of e-beam evaporated Ti for high refractive index TiO2 layers and laser damage resistant, broad bandwidth, high reflection coatings

Bellum, John C.; Field, Ella S.; Kletecka, Damon E.; Long, Finis W.

We optimize reactive, ion-assisted deposition (O2 levels, deposition rate and ion beam settings) using e-beam evaporated Ti for high refractive index, low absorption TiO2 layers and laser damage resistant, broad bandwidth high reflection coatings. © OSA 2013.