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Plasma-etching science meets technology in the MDL

Greenberg, K.E.; Miller, P.A.; Patteson, R.; Smith, B.K.

Results from fundamental investigations of low-temperature plasma systems were used to improve chamber-to-chamber reproducibility and reliability in commercial plasma-etching equipment. The fundamental studies were performed with a GEC RF Reference Cell, a laboratory research system designed to facilitate experimental and theoretical studies of plasma systems. Results and diagnostics from the Reference Cell studies were then applied to analysis and rectification of chamber-to-chamber variability on a commercial, multichamber, plasma reactor. Pertinent results were transferred to industry.