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Parametric dependences of the 2. 63 and 2. 65. mu. m laser lines of atomic xenon

Brannon, P.J.

Preliminary results for the parametric dependences of the 2.63 and 2.65 {mu}m lines of a high-pressure xenon laser are given. The power deposition is varied from 200 to 800 W/cm{sup 3} for gas mixtures of Ar(830 Torr)/Xe(4 Torr), Ar(750 Torr)/Xe(83 Torr) and Ar(621 Torr)/He(210 Torr)/Xe(4 Torr). The 2.65 {mu}m line dominates the 2.63 {mu}m line for all gas mixtures and the ratio of the 2.63 {mu}m line intensity to that for the 2.65 {mu}m line is suppressed by the higher concentration of xenon. 13 refs., 4 figs.