Publications Details

Ion-implanted GaAs JFETs with f{sub t} {gt} 45 GHz for low-power electronics

Zolper, J.C.

GaAs Junction Field Effect Transistors (JFETs) are reported with gate lengths down to 0.3 micrometers. The structure is fully self-aligned and employs all ion implantation doping. p[sup +]-gate regions are formed with either Zn or Cd implants along with a P coimplantation to reduce diffusion. The source and rain implants are engineered with Si or SiF implants to minimize short channel effects. JFETs with 0.3 micrometer gate length are demonstrated with a sub-threshold slope of 110 mV/decade along with an intrinsic unity current gain cutoff frequency as high as 52 GHz.