Publications Details
Influence of Surface Material on the BCl Density in Inductively Coupled Discharges
The relative density of BCl radicals has been measured in a modified Applied Materials DPS metal etch chamber using laser-induced fluorescence. In plasmas containing mixtures of BCl{sub 3} with Cl{sub 2}, Ar and/or N{sub 2}, the relative BCl density was measured as a function of source and bias power, pressure, flow rate, BCl{sub 3}/Cl{sub 2} ratio and argon addition. To determine the influence of surface materials on the bulk plasma properties, the relative BCl density was measured using four different substrate types; aluminum, alumina, photoresist, and photoresist-patterned aluminum. In most cases, the relative BCl density was highest above photoresist-coated wafers and lowest above blanket aluminum wafers. The BCl density increased with increasing source power and the ratio of BCl{sub 3} to Cl{sub 2}, while the addition of N{sub 2} to a BCl{sub 3}/Cl{sub 2} plasma resulted in a decrease in BCl density. The BCl density was relatively insensitive to changes in the other plasma parameters.