Publications Details
In situ monitoring of thin film deposition using optical fibers
A novel technique to monitor thin film deposition has been developed using optical fibers. The system measures the optical thickness of a film and not the physical thickness which results in accurate film deposition for optical applications regardless of deposition conditions. A discussion of the mathematics necessary to understand the operation of the system is presented. The details of the circuitry and software are presented. The performance of the system is then demonstrated for the deposition of SnO{sub 2} on an optical fiber. An analysis of the inherent errors present in the monitor electronics and measurement system and their effects on the accuracy of the deposition is presented. The system is then applied to several practical situations. First, the system is used to monitor the deposition of SnO{sub 2} films on microscope slides. The films on the slides are then shown to have optical thicknesses which are within 1% of the expected values. The system is next used to deposit SiO anti-reflective coatings on Si. The system is then used to monitor the aging effects seen in SiO and SnO{sub 2}. Finally, a seven layer dielectric mirror made from SnO{sub 2} and MgF{sub 2} films is deposited using the monitor. 25 figs., 1 tabs.