Publications Details
Particle transport in plasma reactors
SEMATECH and the Department of Energy have established a Contamination Free Manufacturing Research Center (CFMRC) located at Sandia National Laboratories. One of the programs underway at the CFMRC is directed towards defect reduction in semiconductor process reactors by the application of computational modeling. The goal is to use fluid, thermal, plasma, and particle transport models to identify process conditions and tool designs that reduce the deposition rate of particles on wafers. The program is directed toward defect reduction in specific manufacturing tools, although some model development is undertaken when needed. The need to produce quantifiable improvements in tool defect performance requires the close cooperation among Sandia, universities, SEMATECH, SEMATECH member companies, and equipment manufacturers. Currently, both plasma (e.g., etch, PECVD) and nonplasma tools (e.g., LPCVD, rinse tanks) are being worked on under this program. In this paper the authors summarize their recent efforts to reduce particle deposition on wafers during plasma-based semiconductor manufacturing.