This paper introduces approaches that combine micro/nanomolding, or nanoimprinting, techniques with proximity optical phase mask lithographic methods to form three dimensional (3D) nanostructures in thick, transparent layers of photopolymers. The results demonstrate three strategies of this type, where molded relief structures in these photopolymers represent (i) fine (<1 μm) features that serve as the phase masks for their own exposure, (ii) coarse features (>1 μm) that are used with phase masks to provide access to large structure dimensions, and (iii) fine structures that are used together phase masks to achieve large, multilevel phase modulations. Several examples are provided, together with optical modeling of the fabrication process and the transmission properties of certain of the fabricated structures. Lastly, these approaches provide capabilities in 3D fabrication that complement those of other techniques, with potential applications in photonics, microfluidics, drug delivery and other areas.
The LIGA microfabrication technique offers a unique method for fabricating 3-dimensional photonic lattices based on the Iowa State "logpile" structure. These structures represent the [111] orientation of the [100] logpile structures previously demonstrated by Sandia National Laboratories, The novelty to this approach is the single step process that does not require any alignment. The mask and substrate are fixed to one another and exposed twice from different angles using a synchrotron light source. The first exposure patterns the resist at an angle of 45 degrees normal to the substrate with a rotation of 8 degrees. The second exposure requires a 180 degree rotation about the normal of the mask and substrate. The resulting pattern is a vertically oriented logpile pattern that is rotated slightly off axis. The exposed PMMA is developed in a single step to produce an inverse lattice structure. This mold is filled with electroplated gold and stripped away to create a usable gold photonic crystal. Tilted logpiles demonstrate band characteristics very similar to those observed from [100] logpiles. Reflectivity tests show a band edge around 5 μm and compare well with numerical simulations.