Publications

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Arc-jet wind tunnels produce conditions simulating high-altitude hypersonic flight such as occurs upon entry of space craft into planetary atmospheres. They have traditionally been used to study flight in Earth's atmosphere, which consists mostly of nitrogen and oxygen. NASA is presently using arc jets to study entry into Mars' atmosphere, which consists of carbon dioxide and nitrogen. In both cases, a wide variety of chemical reactions take place among the gas constituents and with test articles placed in the flow. In support of those studies, we made measurements using a residual gas analyzer (RGA) that sampled the exhaust stream of a NASA arc jet. The experiments were conducted at the HYMETS arc jet (Hypersonic Materials Environmental Test System) located at the NASA Langley Research Center, Hampton, VA. This report describes our RGA measurements, which are intended to be used for model validation in combination with similar measurements on other systems.

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The radial distribution of the measured voltage drop across a sheath formed between a 300 mm electrode and an argon plasma discharge is shown to depend on the excitation radio frequency, under constant power and pressure conditions. At a lower frequency of 13.56 MHz, the voltage drop across the sheath is uniform across the 300 mm electrode, while at higher frequencies of 60 and 162 MHz the voltage drop becomes radially nonuniform. The magnitude and spatial extent of the nonuniformity become greater with increasing frequency. © 2007 American Institute of Physics.

The spatial structure and temporal evolution of the electric fields in a sheath formed in a dual frequency, 300 mm capacitive argon discharge are measured as functions of relative mixing between a low frequency current and a high frequency current. It is found that the overall structure of the sheath (potential across the sheath and the thickness of the sheath) are dominated by the lower frequency component while (smaller) oscillations in these quantities are dictated by the higher frequency component. Comparisons of the measured spatial and temporal profiles are made for Lieberman's and Robiche et al sheath model and with a particle in a cell calculation. © 2007 IOP Publishing Ltd.

Carbon nanotubes have shown promise for applications in many diverse areas of technology. In this report we describe our efforts to develop high-current cathodes from a variety of nanotubes deposited under a variety of conditions. Our goal was to develop a one-inch-diameter cathode capable of emitting 10 amperes of electron current for one second with an applied potential of 50 kV. This combination of current and pulse duration significantly exceeds previously reported nanotube-cathode performance. This project was planned for two years duration. In the first year, we tested the electron-emission characteristics of nanotube arrays fabricated under a variety of conditions. In the second year, we planned to select the best processing conditions, to fabricate larger cathode samples, and to test them on a high-power relativistic electron beam generator. In the first year, much effort was made to control nanotube arrays in terms of nanotube diameter and average spacing apart. When the project began, we believed that nanotubes approximately 10 nm in diameter would yield sufficient electron emission properties, based on the work of others in the field. Therefore, much of our focus was placed on measured field emission from such nanotubes grown on a variety of metallized surfaces and with varying average spacing between individual nanotubes. We easily reproduced the field emission properties typically measured by others from multi-wall carbon nanotube arrays. Interestingly, we did this without having the helpful vertical alignment to enhance emission; our nanotubes were randomly oriented. The good emission was most likely possible due to the improved crystallinity, and therefore, electrical conductivity, of our nanotubes compared to those in the literature. However, toward the end of the project, we learned that while these 10-nm-diameter CNTs had superior crystalline structure to the work of others studying field emission from multi-wall CNT arrays, these nanotubes still had a thin coating of glassy carbon surrounding them in a sheath-like manner. This glassy carbon, or nano-crystalline graphite, is likely to be a poor conductor due to phonon scattering, and should actually be deleterious for extracting electrons with electric fields. While we did not achieve the field emission reported for single-wall carbon nanotubes that spurred the idea for this project, at the year's very end, we had a breakthrough in materials growth and learned to control the growth of very-small diameter nanotubes ranging from 1.4 to 7 nm. The 1.4-nm nanotubes are single-walled and grow at only 530 C. This is the lowest temperature known to result in single-wall carbon nanotubes, and may be very important for many applications that where certain substrates could not be used due to the high temperatures commonly used for CNT growth. Critically important for field emission, these small diameter nanotubes, consisting of only a few concentric graphene cylindrical walls, do not show the presence of a poorly-conductive sheath material. Therefore, these nanotubes will almost definitely have superior field emission properties to those we already measured, and it is possible that they could provide the necessary field emission to make this project successful. Controlled spacing and lengths of these single-wall nanotubes have yet to be explored, along with correlating their structures to their improved field emission. Unfortunately, we did not discover the methods to grow these highly-crystalline and small diameter CNTs until late in the year. Since we did not achieve the necessary emission properties by mid-year, the project was ''prematurely'' terminated prior to the start of the second year. However, it should be noted that with the late developments, this work has not hit the proverbial ''brick wall''. Clearly the potential still exists to reproduce and even exceed the high emission results reported for randomly-oriented and curly single-wall carbon nanotubes, both in terms of total field emitting currents and perhaps more importantly, in reproducibility.

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There is much interest in scaling rf-excited capacitively coupled plasma reactors to larger sizes and to higher frequencies. As the size approaches operating wavelength, concerns arise about non-uniformity across the work piece, particularly in light of the well-documented slow-surface-wave phenomenon. We present measurements and calculations of spatial and frequency dependence of rf magnetic fields inside argon plasma in an industrially relevant, 300 mm plasma-processing chamber. The results show distinct differences in the spatial distributions and harmonic content of rf fields in the plasma at the three frequencies studied (13.56, 60 and 176 MHz). Evidence of a slow-wave structure was not apparent. The results suggest that interaction between the plasma and the rf excitation circuit may strongly influence the structures of these magnetic fields and that this interaction is frequency dependent. At the higher frequencies, wave propagation becomes extremely complex; it is controlled by the strong electrical nonlinearity of the sheath and is not explained simply by previous models. © 2006 IOP Publishing Ltd.

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Dual-frequency reactors employ source rf power supplies to generate plasma and bias supplies to extract ions. There is debate over choices for the source and bias frequencies. Higher frequencies facilitate plasma generation but their shorter wavelengths may cause spatial variations in plasma properties. Electrical nonlinearity of plasma sheaths causes harmonic generation and mixing of source and bias frequencies. These processes, and the resulting spectrum of frequencies, are as much dependent on electrical characteristics of matching networks and on chamber geometry as on plasma sheath properties. We investigated such electrical effects in a 300-mm Applied-Materials plasma reactor. Data were taken for 13.56-MHz bias frequency (chuck) and for source frequencies from 30 to 160 MHz (upper electrode). An rf-magnetic-field probe (B-dot loop) was used to measure the radial variation of fields inside the plasma. We will describe the results of this work.

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This report documents the strategies for verification and validation of the codes LSP and ICARUS used for simulating the operation of the neutron tubes used in all modern nuclear weapons. The codes will be used to assist in the design of next generation neutron generators and help resolve manufacturing issues for current and future production of neutron devices. Customers for the software are identified, tube phenomena are identified and ranked, software quality strategies are given, and the validation plan is set forth.

Radio frequency (rf) power is applied to the chuck of a high-density plasma reactor in order to extract ions and to control the energy of the ions used for the fabrication of microelectronic devices. In many cases, the temporal shape of the rf waveform largely determines the shape of the spectrum of those extracted ions, thereby strongly affecting feature evolution. Using auxiliary rf circuits the authors successfully made major changes to the rf potential waveform at the chuck of an Applied Materials 5300 HDP Omega reactor without affecting the normal functioning of the reactor's control systems. This work established the practical feasibility of techniques for modifying the ion energy distribution functions of industrial reactors.

Laser induced fluorescence has been used to measure the spatial distribution of the two lowest energy argon excited states, 1s{sub 5} and 1s{sub 4}, in inductively driven plasmas containing argon, chlorine and boron trichloride. The behavior of the two energy levels with plasma conditions was significantly different, probably because the 1s{sub 5} level is metastable and the 1s{sub 4} level is radiatively coupled to the ground state but is radiation trapped. The argon data is compared with a global model to identify the relative importance of processes such as electron collisional mixing and radiation trapping. The trends in the data suggest that both processes play a major role in determining the excited state density. At lower rfpower and pressure, excited state spatial distributions in pure argon were peaked in the center of the discharge, with an approximately Gaussian profile. However, for the highest rfpowers and pressures investigated, the spatial distributions tended to flatten in the center of the discharge while the density at the edge of the discharge was unaffected. The spatially resolved excited state density measurements were combined with previous line integrated measurements in the same discharge geometry to derive spatially resolved, absolute densities of the 1s{sub 5} and 1s{sub 4} argon excited states and gas temperature spatial distributions. Fluorescence lifetime was a strong fi.mction of the rf power, pressure, argon fraction and spatial location. Increasing the power or pressure resulted in a factor of two decrease in the fluorescence lifetime while adding Cl{sub 2} or BCl{sub 3} increased the fluorescence lifetime. Excited state quenching rates are derived from the data. When Cl{sub 2} or BCl{sub 3} was added to the plasma, the maximum argon metastable density depended on the gas and ratio. When chlorine was added to the argon plasma, the spatial density profiles were independent of chlorine fraction. While it is energetically possible for argon excited states to dissociate some of the molecular species present in this discharge, it does not appear to be a significant source of dissociation. The major source of interaction between the argon and the molecular species BCl{sub 3} and Cl{sub 2} appears to be through modification of the electron density.

Electron and negative ion densities have been measured in inductively coupled discharges containing C{sub 2}F{sub 6} and CHF{sub 3}. Line integrated electron density was determined using a microwave interferometer, negative ion densities were inferred using laser photodetachment spectroscopy, and electron temperature was determined using a Langmuir probe. For the range of induction powers, pressures and bias power investigated, the electron density peaked at 9 x 10{sup 12} cm{sup -2} (line-integrated) or approximately 9 x 10{sup 11} cm{sup -3}. The negative ion density peaked at approximately 1.3 x 10{sup 11} cm{sup -3}. A maximum in the negative ion density as a function of induction coil power was observed. The maximum is attributed to a power dependent change in the density of one or more of the potential negative ion precursor species since the electron temperature did not depend strongly on power. The variation of photodetachment with laser wavelength indicated that the dominant negative ion was F{sup -}. Measurement of the decay of the negative ion density in the afterglow of a pulse modulated discharge was used to determine the ion-ion recombination rate for CF{sub 4}, C{sub 2}F{sub 6} and CHF{sub 3} discharges.

Radio-frequency (rf) electrical sources are commonly used to generate plasmas for processing of industrial materials and for related experimental work. Published descriptions of such plasmas usually include generator-power measurements, and occasionally include plasma dc-bias measurements. One or both of these quantitites are also used in industrial feedback ccontrol systems for setpoint regulation. Recent work at Sandia an elsewhere with an experimental rf discharge device (the GEC RF Reference Cell'') has shown that power and dc-bias levels are often insufficient information for specifying the state of the plasma. The plasma can have nonlinear electrical characteristics that cause harmonic generation, and the harmonic levels can depend sensitively on the impedance of the external circuitry at harmonic frequencies. Even though the harmonics may be low in amplitude, they can be directly related to large changes in plasma power and to changes in optical emission from the plasma. Consequently, in order for a worker to truly master the plasma-generation process, it is necessary to understand, measure, and control electrical characteristics of the plamsa. In this paper we describe technique that have been developed from work with the Reference Cell for making electrical measurements on rf plasmas, and we describe surprising observations of harmonic behavior. 10 refs., 4 figs.