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Low-Frequency Noise and Deep Level Transient Spectroscopy in n-p-n Si Bipolar Junction Transistors Irradiated with Si Ions

IEEE Transactions on Nuclear Science

Luo, Xuyi; Montes, Jossue; Koukourinkova-Duncan, Sabina; Vaandrager, Bastiaan L.; Bielejec, Edward S.; Vizkelethy, Gyorgy V.; Schrimpf, Ronald D.; Fleetwood, Daniel M.; Zhang, En X.

The properties of defects in n-p-n Si bipolar junction transistors (BJTs) caused by 17-MeV Si ions are investigated via current-voltage, low-frequency (LF) noise, and deep level transient spectroscopy (DLTS) measurements. Four prominent radiation-induced defects in the base-collector junction of these transistors are identified via DLTS. At least two defect levels are observed in temperature-dependent LF 1/f noise measurements, one that is similar to a prominent defect in DLTS and another that is not. Defect microstructures are discussed. Our results show that DLTS and 1/f noise measurements can provide complementary information about defects in linear bipolar devices.

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Single Event Upset and Total Ionizing Dose Response of 12LP FinFET Digital Circuits

Spear, Matthew; Wallace, Trace; Wilson, Donald; Solano, Jose; Irumva, Gedeon; Esqueda, Ivan S.; Barnaby, Hugh J.; Clark, Lawrence T.; Brunhaver, John; Turowski, Marek; Mikkola, Esko; Hughart, David R.; Young, Joshua M.; Manuel, Jack E.; Agarwal, Sapan A.; Vaandrager, Bastiaan L.; Vizkelethy, Gyorgy V.; Gutierrez, Amos; Trippe, James M.; King, Michael P.; Bielejec, Edward S.; Marinella, Matthew J.

Abstract not provided.

Single Event Upset and Total Ionizing Dose Response of 12LP FinFET Digital Circuits

Spear, Matthew; Wallace, Trace; Wilson, Donald; Solano, Jose; Irumva, Gedeon; Esqueda, Ivan S.; Barnaby, Hugh J.; Clark, Lawrence T.; Brunhaver, John; Turowski, Marek; Mikkola, Esko; Hughart, David R.; Young, Joshua M.; Manuel, Jack E.; Agarwal, Sapan A.; Vaandrager, Bastiaan L.; Vizkelethy, Gyorgy V.; King, Michael P.; Marinella, Matthew J.

Abstract not provided.

Training a Neural Network on Analog TaOx ReRAM Devices Irradiated With Heavy Ions: Effects on Classification Accuracy Demonstrated With CrossSim

IEEE Transactions on Nuclear Science

Jacobs-Gedrim, Robin B.; Hughart, David R.; Agarwal, Sapan A.; Vizkelethy, Gyorgy V.; Bielejec, Edward S.; Vaandrager, Bastiaan L.; Swanson, Scot E.; Knisely, Kathrine E.; Taggart, J.L.; Barnaby, H.J.; Marinella, Matthew J.

The image classification accuracy of a TaOx ReRAM-based neuromorphic computing accelerator is evaluated after intentionally inducing a displacement damage up to a fluence of 1014 2.5-MeV Si ions/cm2 on the analog devices that are used to store weights. Results are consistent with a radiation-induced oxygen vacancy production mechanism. When the device is in the high-resistance state during heavy ion radiation, the device resistance, linearity, and accuracy after training are only affected by high fluence levels. The findings in this paper are in accordance with the results of previous studies on TaOx-based digital resistive random access memory. When the device is in the low-resistance state during irradiation, no resistance change was detected, but devices with a 4-kΩ inline resistor did show a reduction in accuracy after training at 1014 2.5-MeV Si ions/cm2. This indicates that changes in resistance can only be somewhat correlated with changes to devices' analog properties. This paper demonstrates that TaOx devices are radiation tolerant not only for high radiation environment digital memory applications but also when operated in an analog mode suitable for neuromorphic computation and training on new data sets.

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Comparison of Gain Degradation and Deep Level Transient Spectroscopy in pnp Si Bipolar Junction Transistors Irradiated With Different Ion Species

IEEE Transactions on Nuclear Science

Aguirre, Brandon A.; Bielejec, Edward S.; Fleming, R.M.; Vizkelethy, Gyorgy V.; Vaandrager, Bastiaan L.; Campbell, Jonathan C.; Martin, William J.; King, D.B.

We studied the effect of light ion and heavy ion irradiations on pnp Si BJTs. A mismatch in DLTS deep peak amplitude for devices with same final gain but irradiated with different ion species was observed. Also, different ions cause different gain degradation when the DLTS spectra are matched. Pre-dosed ion-irradiated samples show that ion induced ionization does not account for the differences in DLTS peak height but isochronal annealing studies suggest that light ions produce more VP defects than heavy ions to compensate for the lack of clusters that heavy ions produce. The creation of defect clusters by heavy ions is evident by the higher content of E4 and V2∗ defects compared to light ions.

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Influence of ambient on hydrogen release from p-type gallium nitride

Proposed for publication in Journal of Applied Physics.

Myers, S.M.; Myers, S.M.; Vaandrager, Bastiaan L.; Wampler, William R.; Seager, Carleton H.

Mechanisms of H release from Mg-doped, p-type GaN were investigated in vacuum, in N{sub 2} and O{sub 2} gases, and in electron-cyclotron-resonance N{sub 2} plasmas. Replacing grown-in protium with deuterium (D) and employing sensitive nuclear-reaction analysis allowed the retained concentration to be followed quantitatively over two decades during isothermal heating, illuminating the kinetics of controlling processes. Oxidation attending the O{sub 2} exposures was monitored through nuclear-reaction analysis of {sup 18}O. N{sub 2} gas at atmospheric pressure increases the rate of D release appreciably relative to vacuum. The acceleration produced by O{sub 2} gas is much greater, but is diminished in later stages of the release by oxidation. The N{sub 2} plasma employed in these studies had no resolvable effect. We argue that surface desorption is rate controlling in the D release, and that it occurs by D-D recombination and the formation of N-D and O-D species. Our results are quantitatively consistent with a theoretical model wherein the bulk solution is in equilibrium with surface states from which desorption occurs by processes that are both first and second order in surface coverage.

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19 Results
19 Results