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BeyondFingerprinting: AI-guided discovery of robust materials & processes

Boyce, Brad L.; Dingreville, Remi P.M.; Adams, David P.; Martinez, Carianne; Fowler, James E.; Pillars, Jamin R.; Wixom, Ryan R.; Moffat, Harry K.; Davis, Warren L.; Ackerman, Sarah; Speed, Ann E.; Garland, Anthony; Roberts, Scott A.; Coleman, Jonathan J.; Delrio, Frank W.; Cillessen, Dale E.; Carroll, J.D.; Najm, Habib N.; Curry, John F.; Johnson, Kyle L.; Dudley, Sarah K.; Addamane, Sadhvikas J.; Henriksen, Amelia; Custer, Joyce O.; Bays, Nathan R.; Desai, Saaketh; Bassett, Kimberly L.; Shilt, Troy; Walker, Elise; Kalaswad, Matias; Shrivastava, Ankit; Babuska, Tomas F.; Kottwitz, Matthew; Fitzgerald, Kaitlynn; Actor, Jonas A.; Das, Niladri; Bianco, Nathan R.; Watkins, Tylan; Dorman, Kyle R.; Jones, Reese E.; Khalil, Mohammad

BeyondFingerprinting was a 2021-2024 Sandia Grand Challenge LDRD exploring the potential to develop new resilient materials and manufacturing processes by taking an artificial-intelligence (AI)-guided approach that integrates human-subject-matter expertise with algorithms enriched with physics-based constraints to unearth process-structure-property correlations. Such algorithms, trained on high-throughput experiments and simulations, are shown to serve as surrogate models that efficiently detect key “fingerprints” in materials data, prognose material performance, and guide effective process improvements. To accelerate broader adoption across mission areas, this AI-guided approach was demonstrated with three complex process-centric exemplars: electroplating, physical vapor deposition, and laser powder bed fusion. Together, these exemplars impact nearly every hardware component relevant to DOE and NNSA national security missions.

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A Workflow for Accelerating Multimodal Data Collection for Electrodeposited Films

Integrating Materials and Manufacturing Innovation

Bassett, Kimberly L.; Watkins, Tylan; Coleman, Jonathan J.; Bianco, Nathan R.; Bailey, Lauren S.; Pillars, Jamin R.; Williams, Samuel G.; Babuska, Tomas F.; Curry, John F.; Delrio, Frank W.; Henriksen, Amelia; Garland, Anthony; Hall, Justin; Boyce, Brad L.; Krick, Brandon A.

Future machine learning strategies for materials process optimization will likely replace human capital-intensive artisan research with autonomous and/or accelerated approaches. Such automation enables accelerated multimodal characterization that simultaneously minimizes human errors, lowers costs, enhances statistical sampling, and allows scientists to allocate their time to critical thinking instead of repetitive manual tasks. Previous acceleration efforts to synthesize and evaluate materials have often employed elaborate robotic self-driving laboratories or used specialized strategies that are difficult to generalize. Herein we describe an implemented workflow for accelerating the multimodal characterization of a combinatorial set of 915 electroplated Ni and Ni–Fe thin films resulting in a data cube with over 160,000 individual data files. Our acceleration strategies do not require manufacturing-scale resources and are thus amenable to typical materials research facilities in academic, government, or commercial laboratories. The workflow demonstrated the acceleration of six characterization modalities: optical microscopy, laser profilometry, X-ray diffraction, X-ray fluorescence, nanoindentation, and tribological (friction and wear) testing, each with speedup factors ranging from 13–46x. In addition, automated data upload to a repository using FAIR data principles was accelerated by 64x.

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Quality Control Metrics to Assess MoS2 Sputtered Films for Tribological Applications [Slides]

Babuska, Tomas F.; Curry, John F.; Thorpe, Ryan; Dugger, Michael T.; Delrio, Frank W.; Jones, Morgan; Strandwitz, Nicholas C.; Chowdhury, Md I.; Chrostowski, Robert; Mangolini, Filippo; Grejtak, Tomas; Doll, Gary L.; Krick, Brandon

Easily measured metrics that could assign quantifiable values to coating batches for quality control have started to be developed. High-density is an attribute of quality films. Increased density results in harder, more wear resistant coatings in inert and humid environments. Denser films are more resistant to oxidation from aging, limiting the severity and depth of oxide into the coating. Future work includes using metrics for quality. The next step is to develop in house deposition capabilities to develop process-structure relationships.

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Formation of Coherent 1H-1T Heterostructures in Single-Layer MoS2on Au(111)

ACS Nano

Wu, Fanglue; Liu, Zhuotong; Hawthorne, Nathaniel; Chandross, Michael E.; Moore, Quentarius; Argibay, Nicolas; Curry, John F.; Batteas, James D.

Heterojunctions of semiconductors and metals are the fundamental building blocks of modern electronics. Coherent heterostructures between dissimilar materials can be achieved by composition, doping, or heteroepitaxy of chemically different elements. Here, we report the formation of coherent single-layer 1H-1T MoS2 heterostructures by mechanical exfoliation on Au(111), which are chemically homogeneous with matched lattices but show electronically distinct semiconducting (1H phase) and metallic (1T phase) character, with the formation of these heterojunctions attributed to a combination of lattice strain and charge transfer. The exfoliation approach employed is free of tape residues usually found in many exfoliation methods and yields single-layer MoS2 with millimeter (mm) size on the Au surface. Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), scanning tunneling microscopy (STM), and scanning tunneling spectroscopy (STS) have collectively been employed to elucidate the structural and electronic properties of MoS2 monolayers on Au substrates. Bubbles in the MoS2 formed by the trapping of ambient adsorbates beneath the single layer during deposition, have also been observed and characterized. Our work here provides a basis to produce two-dimensional heterostructures which represent potential candidates for future electronic devices.

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Evidence of Inverse Hall-Petch Behavior and Low Friction and Wear in High Entropy Alloys

Scientific Reports

Argibay, Nicolas; Chandross, Michael E.; Jones, Morgan; Nation, B.L.; Wellington-Johnson, John A.; Curry, John F.; Kustas, Andrew B.; Lu, Ping

We present evidence of inverse Hall-Petch behavior for a single-phase high entropy alloy (CoCrFeMnNi) in ultra-high vacuum and show that it is associated with low friction coefficients (~0.3). Grain size measurements by STEM validate a recently proposed dynamic amorphization model that accurately predicts grain size-dependent shear strength in the inverse Hall-Petch regime. Wear rates in the initially soft (coarse grained) material were shown to be remarkably low (~10–6 mm3/N-m), the lowest for any HEA tested in an inert environment where oxidation and the formation of mixed metal-oxide films is mitigated. The combined high wear resistance and low friction are linked to the formation of an ultra-nanocrystalline near-surface layer. The dynamic amorphization model was also used to predict an average high angle grain boundary energy (0.87 J/m2). This value was used to explain cavitation-induced nanoporosity found in the highly deformed surface layer, a phenomenon that has been linked to superplasticity.

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Low friction in bcc metals via grain boundary sliding

Physical Review Materials

Hinkle, Adam R.; Curry, John F.; Lim, Hojun; Nation, B.L.; Jones, Morgan; Wellington-Johnson, John A.; Lu, Ping; Argibay, Nicolas; Chandross, Michael E.

Low friction is demonstrated with pure polycrystalline tantalum sliding contacts in both molecular dynamics simulations and ultrahigh vacuum experiments. This phenomenon is shown to be correlated with deformation occurring primarily through grain boundary sliding and can be explained using a recently developed predictive model for the shear strength of metals. Specifically, low friction is associated with grain sizes at the interface being smaller than a critical, material-dependent value, where a crossover from dislocation mediated plasticity to grain-boundary sliding occurs. Low friction is therefore associated with inverse Hall-Petch behavior and softening of the interface. Direct quantitative comparisons between experiments and atomistic calculations are used to illustrate the accuracy of the predictions.

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