Publications

Abstract not provided.

Abstract not provided.

Understanding of semiconductor breakdown under high electric fields is an important aspect of materials’ properties, particularly for the design of power devices. For decades, a power-law has been used to describe the dependence of material-specific critical electrical field (Ecrit) at which the material breaks down and bandgap (Eg). The relationship is often used to gauge tradeoffs of emerging materials whose properties haven’t yet been determined. Unfortunately, the reported dependencies of Ecrit on Eg cover a surprisingly wide range in the literature. Moreover, Ecrit is a function of material doping. Further, discrepancies arise in Ecrit values owing to differences between punch-through and non-punch-through device structures. We report a new normalization procedure that enables comparison of critical electric field values across materials, doping, and different device types. An extensive examination of numerous references reveals that the dependence Ecrit ∝ Eg1.83 best fits the most reliable and newest data for both direct and indirect semiconductors. Graphical abstract: [Figure not available: see fulltext.].

Ultra-Wide-Bandgap semiconductors hold great promise for future power conversion applications. Figures of Merit (FOMs) are often used as a first means to understand the impact of semiconductor material parameters on power semiconductor performance, and in particular the Unipolar (or Baliga) FOM is often cited for this purpose. However, several factors of importance for Ultra-Wide-Bandgap semiconductors are not considered in the standard treatment of this FOM. For example, the Critical Field approximation has many shortcomings, and alternative transport mechanisms and incomplete dopant ionization are typically neglected. This paper presents the results of a study aimed at incorporating some of these effects into more realistic FOM calculations.