Scanning Capacitance Microscopy Imaging and Registration of 2-D Donor Devices Fabricated via Scanning Tunneling Microscopy
Abstract not provided.
Publications
SiGe on sSOI: Nanoscale Engineering of Structures and Devices on Surfaces
Abstract not provided.
scanning probe microscopy for quantum devices
Abstract not provided.
Probing the limits of STM field-emission-patterned Si:P δ-doped devices
Abstract not provided.
Probing the limits of STM field-emission patterned Si:P δ-doped devices
Abstract not provided.
Probing limits of STM field emission patterned Si:P $\delta$-doped devices
Applied Physics Letters
Abstract not provided.
Scanning Capacitance Microscopy Imaging and Registration of 2-D Donor Devices Fabricated via Scanning Tunneling Microscopy
Abstract not provided.
Donor charge qubits via scanning tunneling microscopy (STM) assisted fabrication
Abstract not provided.
Atomic-precision qubits for adiabatic quantum computing
Abstract not provided.
Atomic-precision fabrication of qubits for an adiabatic quantum computer
Abstract not provided.
STM assisted fabrication of donor qubits
Abstract not provided.
Quantum Device Design with STM Patterned Nanostructures
Abstract not provided.
Donor charge qubits via STM
Abstract not provided.
Exchange Gate Design in Two Donor Qubits
Abstract not provided.
Donor charge qubits via STM assisted fabrication
Abstract not provided.
Development of few-electron Si quantum dots for use as qubits
Abstract not provided.
Palladium diffusion into bulk copper via the (100) surface
Proposed for publication in the Journal of Physics : Condensed Matter.
Using low-energy electron microscopy, we measure the diffusion of Pd into bulk Cu at the Cu(100) surface. Interdiffusion is tracked by measuring the dissolution of the Cu(100)-c(2 x 2)-Pd surface alloy during annealing (T > 240 C). The activation barrier for Pd diffusion from the surface alloy into the bulk is determined to be (1.8 {+-} 0.6) eV. During annealing, we observe the growth of a new layer of Cu near step edges. Under this new Cu layer, dilute Pd remaining near the surface develops a layered structure similar to the Cu{sub 3}Pd L 1{sub 2} bulk alloy phase.
Surface Self-Diffusion and Structural Evolution of Pd/Cu(100) Surface Alloys
Abstract not provided.
Si Adatoms Atop the Si(111)5x2-Au Surface Diffuse in One Dimension by a Defect-Mediated Hopover Process
Abstract not provided.
One-dimensional defect-mediated hopover diffusion of Si adatoms on the Si(111)5x2-Au surface
PHYSICAL REVIEW LETTERS
Abstract not provided.
Results 76–95 of 95