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Wheeler, D.R. (1994). High silicon content silylating reagents for dry-developed positive-tone resists for extreme ultraviolet (13.5 nm) and deep ultraviolet (248 nm) microlithography [Conference]. https://www.osti.gov/biblio/116680

Results 95951–95975 of 99,299
Results 95951–95975 of 99,299