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Photolithography of an atomic-layer resist for selective delta-doping of silicon

Electron Ion and Photon Beam Technology and Nanofabrication

Aaron Michael Katzenmeyer, Andrew David Baczewski, Sanja (non-Sandian) Dmitrovic, Gerardo Andrew, Scott William Schmucker, Evan Mark Anderson, Jeffrey Andrew Ivie, Tzu-Ming Lu, David Scrymgeour, DeAnna Marie Campbell, Daniel Robert Ward, George T. Wang, Shashank Misra

Abstract – 2020 Abstract 2020
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