Aigeldinger, G, DM Skala, SK Griffiths, AA Talin, MW Losey, CYP Yang. Vitreous carbon mask substrate for X-ray lithography. US Patent 7,608,367. October 27, 2009. Granted
Malinowski, M, JT Hachman Jr., CYP Yang, Miniaturized electron multipliers made by LIGA processing. SD-10363/S-109377. June 20, 2006. Submitted
Yang, CYP and L Lin. Vertical integration of ZnO nanowires into asymmetric Pt/ZnO/Ti Schottky UV photodiodes. Proceedings of the 24th IEEE International Conference on Micro Electro Mechanical Systems (MEMS 2011), January 23 - 27, 2011, Cancun, Mexico.
Yang, EL, CC Liu, CYP Yang, CA Steinhaus, PF Nealey, JL Skinner. Nanofabrication of SERS device by an integrated block-copolymer and nanoimprint lithography method. Journal of Vacuum Science and Technology B November/December 2010.
Aigeldinger, G, CYP Yang, DM Skala, DH Morse, AA Talin, SK Griffiths, JT Hachman, JT Ceremuga. (2008). Influence of mask substrate materials on resist sidewall roughness in deep X-ray lithography. Microsystem Technologies 14:277–286.