Ion Beam Manufacture
PDF format (113 kb)
Sandia Manufacturing Science & Technology's Focused Ion Beam (FIB) laboratory provides an opportunity for research, development and prototyping. Currently, our scientists are developing methods for ion beam sculpting microscale tools, components and devices. This includes shaping of specialty tools such as end-mills, turning tools and indenters. Many of these have been used in ultra-precision machining DOE applications. Additionally, staff are developing the capability to ion mill geometrically-complex features and substrates. This includes the ability to sputter predetermined curved shapes of various symmetries and periodicities.
Capabilities and expertise:
- Two custom-built focused ion beam systems for precision ion milling; beam energies are 10-30 keV; target chambers have 1x10-7 Torr base pressure
- Gas assisted sputtering with the aid of various chemicals; includes H2O jet for gas assisted sputtering of diamond
- Microscale Tools (PDF — 652KB)
- Focused ion beam induced chemical vapor deposition; material can be grown locally onto conductive substrates or layers in a direct-write mode; deposited material includes metals (Au, Cu) or SiOx
- Techniques for fabricating 3-dimensional shapes such as hemispheres, paraboloids, sine waves of various periodicities, symmetries and sizes
- Techniques for shaping microtools. Tools of single crystal diamond, tungsten carbide, high-speed steel are regularly made for ultra-precision machining; specialty tools, such as indenters, are possible
- Ability to determine sputter yield and its dependence on incidence angle, dose for almost any material
Resources
- Two custom-built focused ion beam systems for precision ion milling. Liquid metal gallium ion sources are used in both. System 1 has a single lens column. System 2 has a FEI, dual lens, variable aperture magnum column with CDEM. Beam sizes can be varied from 20 nm to 1.5 µm.
- X-y stage with large travel distances. Load lock can accept up to 8" wafers.
- Rotation stage for control of ion beam incidence angle. Capable of full rotation through 360°. This also allows for sputtering of small 3-dimensional substrates such as tubes or fibers.
- ADE Phase Shift white light interferometric microscope for benchtop metrology.
- Scanning electron microscopy, atomic force microscopy and other surface analysis techniques.
Accomplishments
- Developed techniques for shaping micro-cutting tools with the focused ion beam; establishes a cutting edge radius of curvature equal to 40 nanometers as evidenced by transmission electron microscopy
- Microgrooving and microthreading tools for fabricating curvilinear features (PDF — 652KB)
- Micromilling of metal alloys with focused ion beam-fabricated tools (PDF — 733KB)
- Focused ion beam-shaped microtools for ultra-precision machining of cylindrical components (PDF — 469KB)
- Developed techniques for ion shaping predetermined, 3-dimensional shapes
- Focused ion beam milling: Depth control for three-dimensional microfabrication (PDF — 230KB)
- Microfabrication techniques using focused ion beams and emergent applications (PDF — 630KB)
- Shaped target materials for LLNL/NIF high-density plasma experiments
- Researched ion beam induced effects on yield, morphology and microstructure
- Focused ion beam milling of diamond: Effects of H2O on yield, surface morphology and microstructure (PDF — 634KB)
- Developing database for high energy sputter yields. Yield is determined as a function of ion beam incidence angle to 89°
Contacts
David Adams
