Workshop Examines Recycling Ultra-pure Water
Sandia co-sponsored a conservation workshop for industrial, commercial, and
institutional water users on March 29, 2000 in conjunction with the New Mexico
Water Conservation Alliance and Intel. The topic of the conference was water
conservation in semiconductor fabrication plants.
Water conservation is important for semiconductor researchers and
manufacturers, since the fabrication processes require large quantities of
ultra-pure water. This water usually comes from domestic water systems and is
teated by the manufacturers to meet rigid standards of purity and cleanliness.
Increasingly, semiconductor firms, who are expanding their facilities to meet
the rapidly increasing demand for their products, are finding the cost of both
the water supply and treatment is cause for concern. Recycling the ultra-pure
water from the process back into the treatment plant may be a solution to both
problems.
The water recycling workshop involved participants from semiconductor
manufacturers like Intel, Phillips, and Sumitomo, as well as other interested
parties from the research, engineering, and industrial communities. Papers were
presented by speakers from Sandia, Atmel in Colorado Springs, and Texas
Instruments in Dallas
Presentations:
Reclaiming Microelectronics Waste Water for Use
in Cooling Towers
Darell Rogers (PowerPoint, 3.6 Mbytes)
Papers
Design of Recycling System for Spent Rinse Water from
Sandia's Microelectronics Development Laboratory (MDL)
Robert P. Donovan, Dennis J. Morrison, Robert P. Timon, and John DeGenova
(.pdf, 584 KBytes)
Evaluation of 3 Commercially Available, On-line TOC
Analyzers for Monitoring Recycled Water in Semiconductor Processing
Robert P. Donovan and Dennis Morrison (.pdf, 600 KBytes)
Performance of a Treatment Loop for Recycling Spent
Rinse Waters
Robert P. Donovan, Robert P. Timon, Michael J. DeBusk, Ronald V. Jones and
Darell M. Rogers (.pdf, 621 KBytes)
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